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Bibliographic details for 18457908. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)

Citation styles for 18457908. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)

APA style

18457908. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation). (2024, January 1). WikiPatents, . Retrieved 20:57, May 28, 2024 from http://wikipatents.org/index.php?title=18457908._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_MANUFACTURING_ELECTRONIC_DEVICE_simplified_abstract_(FUJIFILM_Corporation)&oldid=18734.

MLA style

"18457908. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)." WikiPatents, . 1 Jan 2024, 18:24 UTC. 28 May 2024, 20:57 <http://wikipatents.org/index.php?title=18457908._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_MANUFACTURING_ELECTRONIC_DEVICE_simplified_abstract_(FUJIFILM_Corporation)&oldid=18734>.

MHRA style

WikiPatents contributors, '18457908. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)', WikiPatents, , 1 January 2024, 18:24 UTC, <http://wikipatents.org/index.php?title=18457908._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_MANUFACTURING_ELECTRONIC_DEVICE_simplified_abstract_(FUJIFILM_Corporation)&oldid=18734> [accessed 28 May 2024]

Chicago style

WikiPatents contributors, "18457908. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)," WikiPatents, , http://wikipatents.org/index.php?title=18457908._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_MANUFACTURING_ELECTRONIC_DEVICE_simplified_abstract_(FUJIFILM_Corporation)&oldid=18734 (accessed May 28, 2024).

CBE/CSE style

WikiPatents contributors. 18457908. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation) [Internet]. WikiPatents, ; 2024 Jan 1, 18:24 UTC [cited 2024 May 28]. Available from: http://wikipatents.org/index.php?title=18457908._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_MANUFACTURING_ELECTRONIC_DEVICE_simplified_abstract_(FUJIFILM_Corporation)&oldid=18734.

Bluebook style

18457908. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation), http://wikipatents.org/index.php?title=18457908._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_MANUFACTURING_ELECTRONIC_DEVICE_simplified_abstract_(FUJIFILM_Corporation)&oldid=18734 (last visited May 28, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18457908. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18457908._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_MANUFACTURING_ELECTRONIC_DEVICE_simplified_abstract_(FUJIFILM_Corporation)&oldid=18734",
   note = "[Online; accessed 28-May-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18457908. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18457908._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_MANUFACTURING_ELECTRONIC_DEVICE_simplified_abstract_(FUJIFILM_Corporation)&oldid=18734}",
   note = "[Online; accessed 28-May-2024]"
 }


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