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Bibliographic details for 17850811. INTEGRATED CIRCUIT WITH BOTTOM DIELECTRIC INSULATORS AND FIN SIDEWALL SPACERS FOR REDUCING SOURCE/DRAIN LEAKAGE CURRENTS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)

Citation styles for 17850811. INTEGRATED CIRCUIT WITH BOTTOM DIELECTRIC INSULATORS AND FIN SIDEWALL SPACERS FOR REDUCING SOURCE/DRAIN LEAKAGE CURRENTS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)

APA style

17850811. INTEGRATED CIRCUIT WITH BOTTOM DIELECTRIC INSULATORS AND FIN SIDEWALL SPACERS FOR REDUCING SOURCE/DRAIN LEAKAGE CURRENTS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.). (2024, January 1). WikiPatents, . Retrieved 23:04, June 8, 2024 from http://wikipatents.org/index.php?title=17850811._INTEGRATED_CIRCUIT_WITH_BOTTOM_DIELECTRIC_INSULATORS_AND_FIN_SIDEWALL_SPACERS_FOR_REDUCING_SOURCE/DRAIN_LEAKAGE_CURRENTS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=17937.

MLA style

"17850811. INTEGRATED CIRCUIT WITH BOTTOM DIELECTRIC INSULATORS AND FIN SIDEWALL SPACERS FOR REDUCING SOURCE/DRAIN LEAKAGE CURRENTS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)." WikiPatents, . 1 Jan 2024, 17:36 UTC. 8 Jun 2024, 23:04 <http://wikipatents.org/index.php?title=17850811._INTEGRATED_CIRCUIT_WITH_BOTTOM_DIELECTRIC_INSULATORS_AND_FIN_SIDEWALL_SPACERS_FOR_REDUCING_SOURCE/DRAIN_LEAKAGE_CURRENTS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=17937>.

MHRA style

WikiPatents contributors, '17850811. INTEGRATED CIRCUIT WITH BOTTOM DIELECTRIC INSULATORS AND FIN SIDEWALL SPACERS FOR REDUCING SOURCE/DRAIN LEAKAGE CURRENTS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)', WikiPatents, , 1 January 2024, 17:36 UTC, <http://wikipatents.org/index.php?title=17850811._INTEGRATED_CIRCUIT_WITH_BOTTOM_DIELECTRIC_INSULATORS_AND_FIN_SIDEWALL_SPACERS_FOR_REDUCING_SOURCE/DRAIN_LEAKAGE_CURRENTS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=17937> [accessed 8 June 2024]

Chicago style

WikiPatents contributors, "17850811. INTEGRATED CIRCUIT WITH BOTTOM DIELECTRIC INSULATORS AND FIN SIDEWALL SPACERS FOR REDUCING SOURCE/DRAIN LEAKAGE CURRENTS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=17850811._INTEGRATED_CIRCUIT_WITH_BOTTOM_DIELECTRIC_INSULATORS_AND_FIN_SIDEWALL_SPACERS_FOR_REDUCING_SOURCE/DRAIN_LEAKAGE_CURRENTS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=17937 (accessed June 8, 2024).

CBE/CSE style

WikiPatents contributors. 17850811. INTEGRATED CIRCUIT WITH BOTTOM DIELECTRIC INSULATORS AND FIN SIDEWALL SPACERS FOR REDUCING SOURCE/DRAIN LEAKAGE CURRENTS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) [Internet]. WikiPatents, ; 2024 Jan 1, 17:36 UTC [cited 2024 Jun 8]. Available from: http://wikipatents.org/index.php?title=17850811._INTEGRATED_CIRCUIT_WITH_BOTTOM_DIELECTRIC_INSULATORS_AND_FIN_SIDEWALL_SPACERS_FOR_REDUCING_SOURCE/DRAIN_LEAKAGE_CURRENTS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=17937.

Bluebook style

17850811. INTEGRATED CIRCUIT WITH BOTTOM DIELECTRIC INSULATORS AND FIN SIDEWALL SPACERS FOR REDUCING SOURCE/DRAIN LEAKAGE CURRENTS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.), http://wikipatents.org/index.php?title=17850811._INTEGRATED_CIRCUIT_WITH_BOTTOM_DIELECTRIC_INSULATORS_AND_FIN_SIDEWALL_SPACERS_FOR_REDUCING_SOURCE/DRAIN_LEAKAGE_CURRENTS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=17937 (last visited June 8, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "17850811. INTEGRATED CIRCUIT WITH BOTTOM DIELECTRIC INSULATORS AND FIN SIDEWALL SPACERS FOR REDUCING SOURCE/DRAIN LEAKAGE CURRENTS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=17850811._INTEGRATED_CIRCUIT_WITH_BOTTOM_DIELECTRIC_INSULATORS_AND_FIN_SIDEWALL_SPACERS_FOR_REDUCING_SOURCE/DRAIN_LEAKAGE_CURRENTS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=17937",
   note = "[Online; accessed 8-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "17850811. INTEGRATED CIRCUIT WITH BOTTOM DIELECTRIC INSULATORS AND FIN SIDEWALL SPACERS FOR REDUCING SOURCE/DRAIN LEAKAGE CURRENTS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=17850811._INTEGRATED_CIRCUIT_WITH_BOTTOM_DIELECTRIC_INSULATORS_AND_FIN_SIDEWALL_SPACERS_FOR_REDUCING_SOURCE/DRAIN_LEAKAGE_CURRENTS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=17937}",
   note = "[Online; accessed 8-June-2024]"
 }


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