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Citation styles for 17846948. MULTILAYER GATE ISOLATION STRUCTURE AND METHOD FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)

APA style

17846948. MULTILAYER GATE ISOLATION STRUCTURE AND METHOD FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.). (2024, January 1). WikiPatents, . Retrieved 23:45, May 23, 2024 from http://wikipatents.org/index.php?title=17846948._MULTILAYER_GATE_ISOLATION_STRUCTURE_AND_METHOD_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=17929.

MLA style

"17846948. MULTILAYER GATE ISOLATION STRUCTURE AND METHOD FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)." WikiPatents, . 1 Jan 2024, 17:36 UTC. 23 May 2024, 23:45 <http://wikipatents.org/index.php?title=17846948._MULTILAYER_GATE_ISOLATION_STRUCTURE_AND_METHOD_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=17929>.

MHRA style

WikiPatents contributors, '17846948. MULTILAYER GATE ISOLATION STRUCTURE AND METHOD FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)', WikiPatents, , 1 January 2024, 17:36 UTC, <http://wikipatents.org/index.php?title=17846948._MULTILAYER_GATE_ISOLATION_STRUCTURE_AND_METHOD_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=17929> [accessed 23 May 2024]

Chicago style

WikiPatents contributors, "17846948. MULTILAYER GATE ISOLATION STRUCTURE AND METHOD FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=17846948._MULTILAYER_GATE_ISOLATION_STRUCTURE_AND_METHOD_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=17929 (accessed May 23, 2024).

CBE/CSE style

WikiPatents contributors. 17846948. MULTILAYER GATE ISOLATION STRUCTURE AND METHOD FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) [Internet]. WikiPatents, ; 2024 Jan 1, 17:36 UTC [cited 2024 May 23]. Available from: http://wikipatents.org/index.php?title=17846948._MULTILAYER_GATE_ISOLATION_STRUCTURE_AND_METHOD_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=17929.

Bluebook style

17846948. MULTILAYER GATE ISOLATION STRUCTURE AND METHOD FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.), http://wikipatents.org/index.php?title=17846948._MULTILAYER_GATE_ISOLATION_STRUCTURE_AND_METHOD_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=17929 (last visited May 23, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "17846948. MULTILAYER GATE ISOLATION STRUCTURE AND METHOD FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=17846948._MULTILAYER_GATE_ISOLATION_STRUCTURE_AND_METHOD_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=17929",
   note = "[Online; accessed 23-May-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "17846948. MULTILAYER GATE ISOLATION STRUCTURE AND METHOD FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=17846948._MULTILAYER_GATE_ISOLATION_STRUCTURE_AND_METHOD_FOR_FORMING_THE_SAME_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=17929}",
   note = "[Online; accessed 23-May-2024]"
 }