Difference between revisions of "SUBSTRATE PROCESSING METHOD: abstract simplified (17994181)"
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Latest revision as of 08:17, 15 October 2023
- This abstract for appeared for patent application number 17994181 Titled 'SUBSTRATE PROCESSING METHOD'
Simplified Explanation
The abstract describes a method for processing a substrate. The method involves three steps: first, a silicon film is formed on the substrate. Then, the silicon film is irradiated with microwaves. Finally, the silicon film is soaked in liquid heavy water.
Original Abstract Submitted
A substrate processing method includes; forming a silicon film on a substrate, irradiating the silicon film with microwaves, and soaking the silicon film in liquid heavy water.
