Information for "18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)"
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Basic information
| Display title | 18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) |
| Default sort key | 18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) |
| Page length (in bytes) | 4,525 |
| Page ID | 50743 |
| Page content language | en - English |
| Page content model | wikitext |
| Indexing by robots | Allowed |
| Number of redirects to this page | 0 |
| Counted as a content page | Yes |
Page protection
| Edit | Allow all users (infinite) |
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Edit history
| Page creator | Wikipatents (talk | contribs) |
| Date of page creation | 06:23, 8 May 2024 |
| Latest editor | Wikipatents (talk | contribs) |
| Date of latest edit | 06:23, 8 May 2024 |
| Total number of edits | 1 |
| Total number of distinct authors | 1 |
| Recent number of edits (within past 90 days) | 1 |
| Recent number of distinct authors | 1 |
