View source for Samsung electronics co., ltd. (20240109017). EXHAUST SYSTEM AND EXHAUST METHOD USING BUFFER simplified abstract

=EXHAUST SYSTEM AND EXHAUST METHOD USING BUFFER=


==Organization Name==

[[:Category:samsung electronics co., ltd.|samsung electronics co., ltd.]]


[[Category:samsung electronics co., ltd.]]

==Inventor(s)==

[[:Category:Changseok Yoo of Suwon-si (KR)|Changseok Yoo of Suwon-si (KR)]][[Category:Changseok Yoo of Suwon-si (KR)]]

==EXHAUST SYSTEM AND EXHAUST METHOD USING BUFFER - A simplified explanation of the abstract==


This abstract first appeared for US patent application 20240109017 titled 'EXHAUST SYSTEM AND EXHAUST METHOD USING BUFFER

==Simplified Explanation==

The patent application describes an exhaust system for semiconductor processing, including a process chamber, a buffer for waste gas and powder dispersion, a reactor for burning waste gas, a wet tank for storing cleaning water, and a wet tower for decomposing powder using the cleaning water.

* The exhaust system includes a process chamber where semiconductor processing is performed.
* A buffer is connected to the process chamber to receive waste gas and disperse powder generated during processing.
* A reactor is configured to burn the waste gas.
* A wet tank is connected below the reactor to store cleaning water.
* A wet tower decomposes powder in the waste gas using the cleaning water.

== Potential Applications ==
The technology can be applied in semiconductor manufacturing facilities to efficiently manage waste gas and powder generated during processing.

== Problems Solved ==
1. Efficient disposal of waste gas and powder generated during semiconductor processing.
2. Reduction of environmental impact by burning waste gas and decomposing powder.

== Benefits ==
1. Improved air quality in semiconductor manufacturing facilities.
2. Cost-effective waste management solution.
3. Compliance with environmental regulations.

== Potential Commercial Applications ==
"Efficient Waste Gas and Powder Management System for Semiconductor Processing"

== Possible Prior Art ==
There may be existing exhaust systems for semiconductor processing that address waste gas management, but the specific combination of components described in this patent application may be novel.

== Unanswered Questions ==
=== How does the system handle different types of waste gases and powders generated during semiconductor processing? ===
The patent application does not provide detailed information on the specific mechanisms for handling various types of waste gases and powders.

=== What is the expected lifespan of the components in the exhaust system, and how often would maintenance be required? ===
The patent application does not mention the durability or maintenance schedule for the components in the exhaust system.


==Original Abstract Submitted==

an exhaust system including a process chamber in which a semiconductor processing is performed, a buffer connected to the process chamber, the buffer configured to receive waste gas generated during the semiconductor processing and dualize and disperse powder generated from the waste gas may be provided, a reactor configured to burn the waste gas, a wet tank connected to the reactor, arranged below the reactor, and configured to store cleaning water, and a wet tower configured to decompose the powder in the waste gas by using the cleaning water may be provided.



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