View source for 18199578. LASER CRYSTALLIZATION APPARATUS AND LASER CRYSTALLIZATION METHOD simplified abstract (Samsung Display Co., LTD.)

=LASER CRYSTALLIZATION APPARATUS AND LASER CRYSTALLIZATION METHOD=


==Organization Name==

[[:Category:Samsung Display Co., LTD.|Samsung Display Co., LTD.]]


[[Category:Samsung Display Co., LTD.]]

==Inventor(s)==

[[:Category:Heegwan Ryu of Yongin-si (KR)|Heegwan Ryu of Yongin-si (KR)]][[Category:Heegwan Ryu of Yongin-si (KR)]]

[[:Category:Jaesung Gu of Yongin-si (KR)|Jaesung Gu of Yongin-si (KR)]][[Category:Jaesung Gu of Yongin-si (KR)]]

[[:Category:Deokjae Kim of Yongin-si (KR)|Deokjae Kim of Yongin-si (KR)]][[Category:Deokjae Kim of Yongin-si (KR)]]

[[:Category:Dongchan Seo of Yongin-si (KR)|Dongchan Seo of Yongin-si (KR)]][[Category:Dongchan Seo of Yongin-si (KR)]]

[[:Category:Younghoon Oh of Yongin-si (KR)|Younghoon Oh of Yongin-si (KR)]][[Category:Younghoon Oh of Yongin-si (KR)]]

[[:Category:Yujin Oh of Yongin-si (KR)|Yujin Oh of Yongin-si (KR)]][[Category:Yujin Oh of Yongin-si (KR)]]

[[:Category:Eunji Lim of Yongin-si (KR)|Eunji Lim of Yongin-si (KR)]][[Category:Eunji Lim of Yongin-si (KR)]]

==LASER CRYSTALLIZATION APPARATUS AND LASER CRYSTALLIZATION METHOD - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18199578 titled 'LASER CRYSTALLIZATION APPARATUS AND LASER CRYSTALLIZATION METHOD

==Simplified Explanation==

The laser crystallization apparatus described in the abstract includes multiple laser generators that produce an incident laser beam, an optical system that converts the incident beam into an output laser beam, a process chamber where a thin film on a substrate is crystallized by the output laser beam, monitoring devices for detecting the pulses of the output and incident laser beams, and a controller that controls the oscillation times of the laser generators and generates synthesized pulses for optimal performance.

* Laser generators generate incident laser beam
* Optical system converts incident beam to output laser beam
* Process chamber crystallizes thin film on substrate
* Monitoring devices detect pulses of output and incident laser beams
* Controller controls oscillation times of laser generators and generates synthesized pulses

== Potential Applications ==
The technology can be used in the manufacturing of electronic devices, such as displays and semiconductors, where precise crystallization of thin films is required.

== Problems Solved ==
The apparatus solves the problem of achieving uniform and controlled crystallization of thin films on substrates, which is crucial for the performance and reliability of electronic devices.

== Benefits ==
The technology offers improved efficiency, accuracy, and consistency in the crystallization process, leading to higher quality electronic products.

== Potential Commercial Applications ==
"Advanced Laser Crystallization Technology for Electronic Manufacturing"

== Possible Prior Art ==
One possible prior art could be the use of laser annealing techniques in semiconductor manufacturing processes to improve the properties of thin films.

=== Unanswered Questions ===

=== How does the apparatus handle variations in substrate materials and thicknesses? ===
The abstract does not provide information on how the apparatus adjusts for different substrate materials and thicknesses during the crystallization process.

=== What is the energy efficiency of the laser generators in the apparatus? ===
The abstract does not mention the energy efficiency of the laser generators used in the apparatus.


==Original Abstract Submitted==

A laser crystallization apparatus includes: a plurality of laser generators which generates an incident laser beam; an optical system which optically converts the incident laser beam to an output laser beam; a process chamber in which a thin film formed on a substrate is crystallized by the output laser beam radiated thereto; a first monitoring device which detects a synthesized pulse of the output laser beam; a second monitoring device which detects individual pulses of the incident laser beam; and a controller which controls oscillation times of the plurality of laser generators. The controller generates a plurality of synthesized pulses by combining the individual pulses of the incident laser beam, and derives an optimal synthesized pulse from the plurality of synthesized pulses.



[[Category:H01L21/02]]
[[Category:B23K26/0622]]
[[Category:H01L21/67]]