View source for 17745576. OPTICAL ASSEMBLY WITH COATING AND METHODS OF USE simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)

=OPTICAL ASSEMBLY WITH COATING AND METHODS OF USE=


==Organization Name==

[[:Category:TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.|TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.]]


[[Category:TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.]]

==Inventor(s)==

[[:Category:Wei-Hao Lee of Hsinchu (TW)|Wei-Hao Lee of Hsinchu (TW)]][[Category:Wei-Hao Lee of Hsinchu (TW)]]

[[:Category:Pei-Cheng Hsu of Hsinchu (TW)|Pei-Cheng Hsu of Hsinchu (TW)]][[Category:Pei-Cheng Hsu of Hsinchu (TW)]]

[[:Category:Huan-Ling Lee of Hsinchu (TW)|Huan-Ling Lee of Hsinchu (TW)]][[Category:Huan-Ling Lee of Hsinchu (TW)]]

[[:Category:Ta-Cheng Lien of Hsinchu (TW)|Ta-Cheng Lien of Hsinchu (TW)]][[Category:Ta-Cheng Lien of Hsinchu (TW)]]

[[:Category:Hsin-Chang Lee of Hsinchu (TW)|Hsin-Chang Lee of Hsinchu (TW)]][[Category:Hsin-Chang Lee of Hsinchu (TW)]]

[[:Category:Chin-Hsiang Lin of Hsinchu (TW)|Chin-Hsiang Lin of Hsinchu (TW)]][[Category:Chin-Hsiang Lin of Hsinchu (TW)]]

==OPTICAL ASSEMBLY WITH COATING AND METHODS OF USE - A simplified explanation of the abstract==


This abstract first appeared for US patent application 17745576 titled 'OPTICAL ASSEMBLY WITH COATING AND METHODS OF USE

==Simplified Explanation==

The patent application describes the use of coated nanotubes and bundles of nanotubes to create membranes for optical assemblies in EUV photolithography systems. These optical assemblies are used in methods for patterning materials on a semiconductor substrate.

* Coated nanotubes and bundles of nanotubes are used to create membranes for optical assemblies in EUV photolithography systems.
* These optical assemblies are used in methods for patterning materials on a semiconductor substrate.
* The UV radiation generated in a UV lithography system is passed through a coating layer of the optical assembly, such as a pellicle assembly.
* The UV radiation that has passed through the coating layer is then passed through a matrix of individual nanotubes or a matrix of nanotube bundles.
* The UV radiation that passes through the matrix of nanotubes is reflected from a mask and received at a semiconductor substrate.

== Potential Applications ==
* EUV photolithography systems
* Patterning materials on a semiconductor substrate

== Problems Solved ==
* Improved optical assemblies for EUV photolithography systems
* Enhanced methods for patterning materials on a semiconductor substrate

== Benefits ==
* Higher precision and accuracy in patterning materials on a semiconductor substrate
* Improved efficiency and performance of EUV photolithography systems


==Original Abstract Submitted==

Coated nanotubes and bundles of nanotubes are formed into membranes useful in optical assemblies in EUV photolithography systems. These optical assemblies are useful in methods for patterning materials on a semiconductor substrate. Such methods involve generating, in a UV lithography system, UV radiation. The UV radiation is passed through a coating layer of the optical assembly, e.g., a pellicle assembly. The UV radiation that has passed through the coating layer is passed through a matrix of individual nanotubes or matrix of nanotube bundles. UV radiation that passes through the matrix of individual nanotubes or matrix of nanotube bundles is reflected from a mask and received at a semiconductor substrate.



[[Category:G03F7/20]]