SEARCH RESULTS for assignor:"ZHANG, XUNYUAN"

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(X0) 15467628: METHODS OF FORMING CONDUCTIVE STRUCTURES

(A1) 20180277426: METHODS OF FORMING CONDUCTIVE STRUCTURES

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(X0) 15461634: LOW RESISTANCE RUTHENIUM-CONTAINING CONTACTS

(A1) 20180269297: LOW RESISTANCE RUTHENIUM-CONTAINING CONTACTS

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(X0) 15983168: METAL INTERCONNECTS FOR SUPER (SKIP) VIA INTEGRATION

(A1) 20180269150: METAL INTERCONNECTS FOR SUPER (SKIP) VIA INTEGRATION

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(X0) 15221647: IC STRUCTURE WITH INTERFACE LINER AND METHODS OF FORMING SAME

(A1) 20180033728: IC STRUCTURE WITH INTERFACE LINER AND METHODS OF FORMING SAME

(B2) 1: IC STRUCTURE WITH INTERFACE LINER AND METHODS OF FORMING SAME

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(X0) 15457200: NON-MANDREL CUT FORMATION

(A1) 20180261457: NON-MANDREL CUT FORMATION

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(X0) 15875212: SELF ALIGNED INTERCONNECT STRUCTURES

(A1) 20180151504: SELF ALIGNED INTERCONNECT STRUCTURES

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(X0) 15664584: INVERTED DAMASCENE INTERCONNECT STRUCTURES

(B1) 9: INVERTED DAMASCENE INTERCONNECT STRUCTURES

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(X0) 15359037: SELF-ALIGNED LITHOGRAPHIC PATTERNING

(A1) 20180144979: SELF-ALIGNED LITHOGRAPHIC PATTERNING

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(X0) 15360255: POST SPACER SELF-ALIGNED CUTS

(A1) 20180144976: POST SPACER SELF-ALIGNED CUTS

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(X0) 15343590: METHOD TO FORM AIR-GAP SPACERS AND AIR-GAP SPACER-CONTAINING STRUCTURES

(A1) 20180130899: METHOD TO FORM AIR-GAP SPACERS AND AIR-GAP SPACER-CONTAINING STRUCTURES

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(X0) 15345882: SKIP VIA STRUCTURES

(A1) 20180130699: SKIP VIA STRUCTURES

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(X0) 15363513: SELF ALIGNED INTERCONNECT STRUCTURES

(B1) 9: SELF ALIGNED INTERCONNECT STRUCTURES

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(X0) 15413823: SIDEWALL SPACER PATTERN FORMATION METHOD

(B1) 9: SIDEWALL SPACER PATTERN FORMATION METHOD

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(X0) 15785665: DEVICES AND METHODS OF FORMING LOW RESISTIVITY NOBLE METAL INTERCONNECT

(A1) 20180040555: DEVICES AND METHODS OF FORMING LOW RESISTIVITY NOBLE METAL INTERCONNECT

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(X0) 15689413: METHOD AND APPARATUS FOR PLACING A GATE CONTACT INSIDE A SEMICONDUCTOR ACTIVE REGION HAVING HIGH-K DIELECTRIC GATE CAPS

(A1) 20180012798: METHOD AND APPARATUS FOR PLACING A GATE CONTACT INSIDE A SEMICONDUCTOR ACTIVE REGION HAVING HIGH-K DIELECTRIC GATE CAPS

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(B2) 9: METHOD AND APPARATUS FOR PLACING A GATE CONTACT INSIDE AN ACTIVE REGION OF A SEMICONDUCTOR

(X0) 15202764: METHOD AND APPARATUS FOR PLACING A GATE CONTACT INSIDE AN ACTIVE REGION OF A SEMICONDUCTOR

(A1) 20180012887: METHOD AND APPARATUS FOR PLACING A GATE CONTACT INSIDE AN ACTIVE REGION OF A SEMICONDUCTOR

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(X0) 15377125: METHOD OF MAKING SELF-ALIGNED CONTINUITY CUTS IN MANDREL AND NON-MANDREL METAL LINES

(B1) 9: METHOD OF MAKING SELF-ALIGNED CONTINUITY CUTS IN MANDREL AND NON-MANDREL METAL LINES

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(X0) 15614925: MIDDLE OF THE LINE (MOL) METAL CONTACTS

(B1) 9: MIDDLE OF THE LINE (MOL) METAL CONTACTS

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