SEARCH RESULTS for assignor:"YOUNG, BAO-RU"

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(X0) 15984720: GATE STRUCTURE OF A SEMICONDUCTOR DEVICE

(A1) 20180277654: GATE STRUCTURE OF A SEMICONDUCTOR DEVICE

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(X0) 15925323: Polysilicon Design for Replacement Gate Technology

(A1) 20180212036: Polysilicon Design for Replacement Gate Technology

(B2) 1: Polysilicon Design for Replacement Gate Technology

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(X0) 15978579: Method for Fabricating a Semiconductor Device

(A1) 20180269099: Method for Fabricating a Semiconductor Device

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(X0) 15649865: METAL GATE STRUCTURE AND METHODS THEREOF

(A1) 20180182859: METAL GATE STRUCTURE AND METHODS THEREOF

(B2) 1: METAL GATE STRUCTURE AND METHODS THEREOF

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(X0) 15456889: METHOD OF FORMING GATE STRUCTURE OF A SEMICONDUCTOR DEVICE

(A1) 20170186853: METHOD OF FORMING GATE STRUCTURE OF A SEMICONDUCTOR DEVICE

(B2) 9: METHOD OF FORMING GATE STRUCTURE OF A SEMICONDUCTOR DEVICE

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(X0) 15854358: DUMMY FIN CELL PLACEMENT IN AN INTEGRATED CIRCUIT LAYOUT

(A1) 20180137232: DUMMY FIN CELL PLACEMENT IN AN INTEGRATED CIRCUIT LAYOUT

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(X0) 13793220: Method for Fabricating a Semiconductor Device

(A1) 20140252504: Method for Fabricating a Semiconductor Device

(B2) 9: Method for Fabricating a Semiconductor Device

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(X0) 15863536: SYSTEM AND METHOD OF FABRICATING ESD FINFET WITH IMPROVED METAL LANDING IN THE DRAIN

(A1) 20180130792: SYSTEM AND METHOD OF FABRICATING ESD FINFET WITH IMPROVED METAL LANDING IN THE DRAIN

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(X0) 15620241: POLYSILICON DESIGN FOR REPLACEMENT GATE TECHNOLOGY

(A1) 20170278948: POLYSILICON DESIGN FOR REPLACEMENT GATE TECHNOLOGY

(B2) 9: POLYSILICON DESIGN FOR REPLACEMENT GATE TECHNOLOGY

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(X0) 15349100: SILICON RECESS ETCH AND EPITAXIAL DEPOSIT FOR SHALLOW TRENCH ISOLATION (STI)

(A1) 20170062559: SILICON RECESS ETCH AND EPITAXIAL DEPOSIT FOR SHALLOW TRENCH ISOLATION (STI)

(B2) 9: SILICON RECESS ETCH AND EPITAXIAL DEPOSIT FOR SHALLOW TRENCH ISOLATION (STI)

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(X0) 15717520: Self-Aligned Insulated Film For High-K Metal Gate Device

(A1) 20180019133: Self-Aligned Insulated Film For High-K Metal Gate Device

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(X0) 14975055: DEVICE AND METHODS FOR HIGH-K AND METAL GATE SLACKS

(A1) 20160190018: DEVICE AND METHODS FOR HIGH-K AND METAL GATE SLACKS

(B2) 9: DEVICE AND METHODS FOR HIGH-K AND METAL GATE SLACKS

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(X0) 15339282: SYSTEM AND METHOD OF FABRICATING ESD FINFET WITH IMPROVED METAL LANDING IN THE DRAIN

(B1) 9: SYSTEM AND METHOD OF FABRICATING ESD FINFET WITH IMPROVED METAL LANDING IN THE DRAIN

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(X0) 15197026: DUMMY FIN CELL PLACEMENT IN AN INTEGRATED CIRCUIT LAYOUT

(A1) 20180004882: DUMMY FIN CELL PLACEMENT IN AN INTEGRATED CIRCUIT LAYOUT

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(X0) 15448709: Semiconductor Device and Manufacturing Method Thereof

(B1) 9: Semiconductor Device and Manufacturing Method Thereof