SEARCH RESULTS for assignor:"WU, CHUN-YUAN"

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(X0) 14936370: FIN-TYPE FIELD EFFECT TRANSISTOR AND METHOD OF FORMING THE SAME

(A1) 20170098692: FIN-TYPE FIELD EFFECT TRANSISTOR AND METHOD OF FORMING THE SAME

(B2) 1: FIN-TYPE FIELD EFFECT TRANSISTOR AND METHOD OF FORMING THE SAME

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(X0) 14840038: SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

(A1) 20170040415: SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

(B2) 9: SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

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(X0) 15350453: SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME

(A1) 20180138263: SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME

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(X0) 14872156: SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME

(A1) 20170062484: SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME

(B2) 9: SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME

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(X0) 15346717: CAPACITOR STRUCTURE AND MANUFACTURING METHOD THEREOF

(A1) 20180130871: CAPACITOR STRUCTURE AND MANUFACTURING METHOD THEREOF

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(X0) 15379486: Manufacturing Method of Non-Planar FET

(A1) 20170098710: Manufacturing Method of Non-Planar FET

(B2) 9: Manufacturing Method of Non-Planar FET

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(X0) 15797011: SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

(A1) 20180053826: SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

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(X0) 15221586: METHOD OF FABRICATING A SEMICONDUCTOR STRUCTURE

(A1) 20180033636: METHOD OF FABRICATING A SEMICONDUCTOR STRUCTURE