SEARCH RESULTS for assignor:"LIU, CHEN-YU"

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(X0) 15694222: Negative Tone Developer For Extreme Ultraviolet Lithography

(A1) 20180341177: Negative Tone Developer For Extreme Ultraviolet Lithography

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(X0) 15628261: HARDMASK COMPOSITION AND METHODS THEREOF

(A1) 20180174831: HARDMASK COMPOSITION AND METHODS THEREOF

(B2) 1: HARDMASK COMPOSITION AND METHODS THEREOF

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(X0) 15595525: Patterning Process with Silicon Mask Layer

(A1) 20180174828: Patterning Process with Silicon Mask Layer

(B2) 1: Patterning Process with Silicon Mask Layer

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(X0) 15628261: HARDMASK COMPOSITION AND METHODS THEREOF

(A1) 20180174831: HARDMASK COMPOSITION AND METHODS THEREOF

(B2) 1: HARDMASK COMPOSITION AND METHODS THEREOF

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(X0) 15468109: UNDER LAYER COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

(B1) 1: UNDER LAYER COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

(A1) 20180277359: UNDER LAYER COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

(B2) 1: UNDER LAYER COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

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(X0) 15482315: RESIST MATERIAL AND METHOD FOR FORMING SEMICONDUCTOR STRUCTURE USING RESIST LAYER

(A1) 20180164684: RESIST MATERIAL AND METHOD FOR FORMING SEMICONDUCTOR STRUCTURE USING RESIST LAYER

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(X0) 15697226: Lithography Process With Enhanced Etch Selectivity

(A1) 20180149976: Lithography Process With Enhanced Etch Selectivity

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(X0) 14637379: TOUCH MODULE AND MANUFACTURING METHOD THEREOF

(A1) 20150309615: TOUCH MODULE AND MANUFACTURING METHOD THEREOF

(B2) 9: TOUCH MODULE AND MANUFACTURING METHOD THEREOF

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(X0) 15470332: Developer For Lithography

(A1) 20170199464: Developer For Lithography

(B2) 9: Developer For Lithography

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(X0) 15470332: Developer For Lithography

(A1) 20170199464: Developer For Lithography

(B2) 9: Developer For Lithography

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(X0) 15182160: Extreme Ultraviolet Lithography with Reduced Exposure Dose and Negative Tone Development

(A1) 20170315447: Extreme Ultraviolet Lithography with Reduced Exposure Dose and Negative Tone Development

(B2) 9: Extreme Ultraviolet Lithography with Reduced Exposure Dose and Negative Tone Development