SEARCH RESULTS for assignor:"LIN, CHIN-HSIANG"

Showing 1 to 20 of 30 results

Last Update Patent(s) Assignor(s) Orig. Assignee(s) Assignee(s) Reel/Frame
21-Jun-2018

(X0) 15380911: MATERIAL COMPOSITION AND PROCESS FOR SUBSTRATE MODIFICATION

(A1) 20180174837: MATERIAL COMPOSITION AND PROCESS FOR SUBSTRATE MODIFICATION

LAI, WEI-HAN

WANG, CHIEN-WEI

CHANG, CHING-YU

LIN, CHIN-HSIANG

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

42154/121

21-Jun-2018

(X0) 15474522: Pattern Fidelity Enhancement with Directional Patterning Technology

(A1) 20180174853: Pattern Fidelity Enhancement with Directional Patterning Technology

SHEN, YU-TIEN

HUNG, CHI-CHENG

LIN, CHIN-HSIANG

WANG, CHIEN-WEI

CHANG, CHING-YU

TING, CHIH-YUAN

CHEN, KUEI-SHUN

LIU, RU-GUN

LIN, WEI-LIANG

CHANG, YA HUI

LUNG, YUAN-HSIANG

CHEN, YEN-MING

YEN, YUNG-SUNG

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

42243/63

21-Jun-2018

(A1) 20180173096: Extreme Ultraviolet Photolithography Method With Developer Composition

(X0) 15617300: Extreme Ultraviolet Photolithography Method With Developer Composition

ZI, AN-REN

CHENG, JOY

CHANG, CHING-YU

LIN, CHIN-HSIANG

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

42647/391

21-Jun-2018

(A1) 20180174831: HARDMASK COMPOSITION AND METHODS THEREOF

(X0) 15628261: HARDMASK COMPOSITION AND METHODS THEREOF

LIU, CHEN-YU

CHANG, CHING-YU

LIN, CHIN-HSIANG

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

42760/763

21-Jun-2018

(X0) 15614032: Extreme Ultraviolet Photoresist With High-Efficiency Electron Transfer

(A1) 20180173101: Extreme Ultraviolet Photoresist With High-Efficiency Electron Transfer

LAI, WEI-HAN

LIN, CHIN-HSIANG

WANG, CHIEN-WEI

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

42602/371

21-Jun-2018

(X0) 15621646: Material Composition and Methods Thereof

(A1) 20180177055: Material Composition and Methods Thereof

WANG, SIAO-SHAN

WU, CHENG-HAN

CHANG, CHING-YU

LIN, CHIN-HSIANG

TAIWIN SEMICONDUCTOR MANUFACTURING CO., LTD.

42696/334

21-Jun-2018

(X0) 15621646: Material Composition and Methods Thereof

(A1) 20180177055: Material Composition and Methods Thereof

WANG, SIAO-SHAN

WU, CHENG-HAN

CHANG, CHING-YU

LIN, CHIN-HSIANG

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

43634/275

21-Jun-2018

(X0) 15474522: Pattern Fidelity Enhancement with Directional Patterning Technology

(A1) 20180174853: Pattern Fidelity Enhancement with Directional Patterning Technology

SHEN, YU-TIEN

HUNG, CHI-CHENG

LIN, CHIN-HSIANG

WANG, CHIEN-WEI

CHANG, CHING-YU

TING, CHIH-YUAN

CHEN, KUEI-SHUN

LIU, RU-GUN

LIN, WEI-LIANG

CHANG, YA HUI

LUNG, YUAN-HSIANG

CHEN, YEN-MING

YEN, YUNG-SUNG

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

41801/152

21-Jun-2018

(X0) 15595525: Patterning Process with Silicon Mask Layer

(A1) 20180174828: Patterning Process with Silicon Mask Layer

LIU, CHEN-YU

CHANG, CHING-YU

LIN, CHIN-HSIANG

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

42384/231

21-Jun-2018

(X0) 15628355: MATERIAL COMPOSITION AND METHODS THEREOF

(A1) 20180174830: MATERIAL COMPOSITION AND METHODS THEREOF

WANG, SIAO-SHAN

WU, CHENG-HAN

CHANG, CHING-YU

LIN, CHIN-HSIANG

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

42761/135

21-Jun-2018

(X0) 15628261: HARDMASK COMPOSITION AND METHODS THEREOF

(A1) 20180174831: HARDMASK COMPOSITION AND METHODS THEREOF

LIU, CHEN-YU

CHANG, CHING-YU

LIN, CHIN-HSIANG

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

43698/105

14-Jun-2018

(X0) 15482315: RESIST MATERIAL AND METHOD FOR FORMING SEMICONDUCTOR STRUCTURE USING RESIST LAYER

(A1) 20180164684: RESIST MATERIAL AND METHOD FOR FORMING SEMICONDUCTOR STRUCTURE USING RESIST LAYER

CHANG, YA-CHING

LIU, CHEN-YU

WU, CHENG-HAN

CHANG, CHING-YU

LIN, CHIN-HSIANG

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

41944/20

31-May-2018

(X0) 15412856: Extreme Ultraviolet Photoresist and Method

(A1) 20180149971: Extreme Ultraviolet Photoresist and Method

CHEN, YEN-HAO

LAI, WEI-HAN

WANG, CHIEN-WEI

LIN, CHIN-HSIANG

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD

41050/125

31-May-2018

(X0) 15697226: Lithography Process With Enhanced Etch Selectivity

(A1) 20180149976: Lithography Process With Enhanced Etch Selectivity

LIU, CHEN-YU

CHANG, CHING-YU

LIN, CHIN-HSIANG

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

43510/575

31-May-2018

(X0) 15723582: Photoresist with Gradient Composition for Improved Uniformity

(A1) 20180151351: Photoresist with Gradient Composition for Improved Uniformity

LILIN, CHANG

CHANG, CHING-YU

LIN, CHIN-HSIANG

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

44473/853

31-May-2018

(X0) 15670183: LITHOGRAPHY MASK WITH BOTH TRANSMISSION-TYPE AND REFLECTIVE-TYPE OVERLAY MARKS AND METHOD OF FABRICATING THE SAME

(A1) 20180149959: LITHOGRAPHY MASK WITH BOTH TRANSMISSION-TYPE AND REFLECTIVE-TYPE OVERLAY MARKS AND METHOD OF FABRICATING THE SAME

LIN, YUN-YUE

LEE, HSIN-CHANG

CHEN, CHIA-JEN

LIN, CHIH-CHENG

YEN, ANTHONY

LIN, CHIN-HSIANG

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

45667/803

29-May-2018

(A1) 20180151738: Finfets and Methods of Forming Finfets

(B2) 9: Finfets and Methods of Forming Finfets

(X0) 15455603: Finfets and Methods of Forming Finfets

(B1) 9: Finfets and Methods of Forming Finfets

LIN, CHIN-HSIANG

HUANG, TAI-CHUN

BAO, TIEN-I

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

41539/786

22-May-2018

(X0) 13460884: SEMICONDUCTOR FILM FORMATION APPARATUS AND PROCESS

(A1) 20130295297: SEMICONDUCTOR FILM FORMATION APPARATUS AND PROCESS

(B2) 9: SEMICONDUCTOR FILM FORMATION APPARATUS AND PROCESS

CHOU, YOU-HUA

LEE, CHIH-TSUNG

WU, SHU-FEN

LIN, CHIN-HSIANG

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

28391/187

22-May-2018

(X0) 15352118: FORMATION METHOD OF SEMICONDUCTOR DEVICE STRUCTURE USING PATTERNING STACKS

(A1) 20180138034: FORMATION METHOD OF SEMICONDUCTOR DEVICE STRUCTURE USING PATTERNING STACKS

(B2) 9: FORMATION METHOD OF SEMICONDUCTOR DEVICE STRUCTURE USING PATTERNING STACKS

LIN, LI-YEN

CHANG, CHING-YU

CHEN, KUEI-SHUN

LIN, CHIN-HSIANG

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

40351/306

17-May-2018

(X0) 15352218: TOPOGRAPHIC PLANARIZATION METHOD FOR LITHOGRAPHY PROCESS

(A1) 20180138050: TOPOGRAPHIC PLANARIZATION METHOD FOR LITHOGRAPHY PROCESS

LIN, TZU-YANG

WENG, MING-HUI

WU, CHENG-HAN

LIN, CHIN-HSIANG

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

40345/925