SEARCH RESULTS for assignor:"LEE, TSUNG-LIN"

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(X0) 15043153: SEMICONDUCTOR DEVICE HAVING A STRAINED REGION

(A1) 20160247901: SEMICONDUCTOR DEVICE HAVING A STRAINED REGION

(B2) 9: SEMICONDUCTOR DEVICE HAVING A STRAINED REGION

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(X0) 15429844: METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE WITH SEPARATED MERGED SOURCE/DRAIN STRUCTURE

(A1) 20180151564: METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE WITH SEPARATED MERGED SOURCE/DRAIN STRUCTURE

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(X0) 15429861: METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE WITH MULTILAYERED CHANNEL STRUCTURE

(A1) 20180151717: METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE WITH MULTILAYERED CHANNEL STRUCTURE

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(X0) 15356004: FIN FIELD EFFECT TRANSISTOR (FINFET) DEVICE STRUCTURE

(A1) 20180145076: FIN FIELD EFFECT TRANSISTOR (FINFET) DEVICE STRUCTURE

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(X0) 15348652: FIN FIELD EFFECT TRANSISTOR (FINFET) DEVICE STRUCTURE

(A1) 20180130802: FIN FIELD EFFECT TRANSISTOR (FINFET) DEVICE STRUCTURE

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(X0) 12843693: STI Shape Near Fin Bottom of Si Fin in Bulk FinFET

(A1) 20110097889: STI Shape Near Fin Bottom of Si Fin in Bulk FinFET

(B2) 9: STI Shape Near Fin Bottom of Si Fin in Bulk FinFET

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(X0) 14506296: Methods of Forming Semiconductor Devices and Structures Thereof

(A1) 20160099244: Methods of Forming Semiconductor Devices and Structures Thereof

(B2) 9: Methods of Forming Semiconductor Devices and Structures Thereof