SEARCH RESULTS for assignor:"LAVOIE, ADRIEN"

Showing 1 to 13 of 13 results

Last Update Patent(s) Assignor(s) Orig. Assignee(s) Assignee(s) Reel/Frame
28-Aug-2018

(X0) 15201221: SELECTIVE ATOMIC LAYER DEPOSITION WITH POST-DOSE TREATMENT

(A1) 20180005814: SELECTIVE ATOMIC LAYER DEPOSITION WITH POST-DOSE TREATMENT

(B2) 1: SELECTIVE ATOMIC LAYER DEPOSITION WITH POST-DOSE TREATMENT

KUMAR, PURUSHOTTAM

LAVOIE, ADRIEN

KARIM, ISHTAK

QIAN, JUN

PASQUALE, FRANK L.

LAM RESEARCH CORPORATION

39296/62

21-Jun-2018

(X0) 15385813: CONICAL WAFER CENTERING AND HOLDING DEVICE FOR SEMICONDUCTOR PROCESSING

(A1) 20180171473: CONICAL WAFER CENTERING AND HOLDING DEVICE FOR SEMICONDUCTOR PROCESSING

AGARWAL, PULKIT

KARIM, ISHTAK

KUMAR, PURUSHOTTAM

LAVOIE, ADRIEN

KIM, SUNG JE

BREILING, PATRICK

LAM RESEARCH CORPORATION

41169/248

12-Jun-2018

(X0) 14194549: CAPPED ALD FILMS FOR DOPING FIN-SHAPED CHANNEL REGIONS OF 3-D IC TRANSISTORS

(A1) 20160379826: CAPPED ALD FILMS FOR DOPING FIN-SHAPED CHANNEL REGIONS OF 3-D IC TRANSISTORS

(B2) 9: CAPPED ALD FILMS FOR DOPING FIN-SHAPED CHANNEL REGIONS OF 3-D IC TRANSISTORS

ARGHAVANI, REZA

TAN, SAMANTHA

VARADARAJAN, BHADRI N

LAVOIE, ADRIEN

BANERJI, ANANDA

QIAN, JUN

SWAMINATHAN, SHANKAR

LAM RESEARCH CORPORATION

32711/790

12-Jun-2018

(X0) 15089960: SYSTEMS AND METHODS FOR FREQUENCY MODULATION OF RADIOFREQUENCY POWER SUPPLY FOR CONTROLLING PLASMA INSTABILITY

(A1) 20170141002: SYSTEMS AND METHODS FOR FREQUENCY MODULATION OF RADIOFREQUENCY POWER SUPPLY FOR CONTROLLING PLASMA INSTABILITY

(B2) 9: SYSTEMS AND METHODS FOR FREQUENCY MODULATION OF RADIOFREQUENCY POWER SUPPLY FOR CONTROLLING PLASMA INSTABILITY

KARIM, ISHTAK

SAKIYAMA, YUKINORI

RANGINENI, YASWANTH

AUGUSTYNIAK, EDWARD

KEIL, DOUGLAS

CHANDRASEKHARAN, RAMESH

LAVOIE, ADRIEN

LEESER, KARL

LAM RESEARCH CORPORATION

38185/4

12-Jun-2018

(X0) 15582359: ATOMIC LAYER ETCH METHODS AND HARDWARE FOR PATTERNING APPLICATIONS

(B1) 9: ATOMIC LAYER ETCH METHODS AND HARDWARE FOR PATTERNING APPLICATIONS

AGARWAL, PULKIT

KUMAR, PURUSHOTTAM

LAVOIE, ADRIEN

LAM RESEARCH CORPORATION

42186/963

15-May-2018

(X0) 14798652: SYSTEMS AND METHODS FOR VAPOR DELIVERY IN A SUBSTRATE PROCESSING SYSTEM

(A1) 20160032453: SYSTEMS AND METHODS FOR VAPOR DELIVERY IN A SUBSTRATE PROCESSING SYSTEM

(B2) 9: SYSTEMS AND METHODS FOR VAPOR DELIVERY IN A SUBSTRATE PROCESSING SYSTEM

QIAN, JUN

KANG, HU

KUMAR, PURUSHOTTAM

BALDASSERONI, CHLOE

LANDIS, HEATHER

DUVALL, ANDREW

SABRI, MOHAMED

CHANDRASEKHARAN, RAMESH

LEESER, KARL

SWAMINATHAN, SHANKAR

SMITH, DAVID

BALDWIN, JEREMIAH

RANGANTHAN, EASHWAR

LAVOIE, ADRIEN

PASQUALE, FRANK

HA, JEONGSEOK

BAE, INGI

LAM RESEARCH CORPORATION

36082/458

03-May-2018

(X0) 15431088: PLANAR SUBSTRATE EDGE CONTACT WITH OPEN VOLUME EQUALIZATION PATHWAYS AND SIDE CONTAINMENT

(A1) 20180122685: PLANAR SUBSTRATE EDGE CONTACT WITH OPEN VOLUME EQUALIZATION PATHWAYS AND SIDE CONTAINMENT

BREILING, PATRICK

CHANDRASEKHARAN, RAMESH

LEESER, KARL

KONKOLA, PAUL

LAVOIE, ADRIEN

BALDASSERONI, CHLOE

SWAMINATHAN, SHANKAR

KARIM, ISHTAK

SAKIYAMA, YUKINORI

MINSHALL, EDMUND

KIM, SUNG JE

DUVALL, ANDREW

PASQUALE, FRANK

LAM RESEARCH CORPORATION

41241/46

20-Mar-2018

(X0) 14805807: VALVE MANIFOLD DEADLEG ELIMINATION VIA REENTRANT FLOW PATH

(A1) 20160147234: VALVE MANIFOLD DEADLEG ELIMINATION VIA REENTRANT FLOW PATH

(B2) 9: VALVE MANIFOLD DEADLEG ELIMINATION VIA REENTRANT FLOW PATH

LEESER, KARL

SANGPLUNG, SAANGRUT

SWAMINATHAN, SHANKAR

PASQUALE, FRANK

BALDASSERONI, CHLOE

MINSHALL, TED

LAVOIE, ADRIEN

LAM RESEARCH CORPORATION

36153/297

15-Mar-2018

(X0) 15263838: SYSTEMS AND METHODS FOR REDUCING EFFLUENT BUILD-UP IN A PUMPING EXHAUST SYSTEM

(A1) 20180073137: SYSTEMS AND METHODS FOR REDUCING EFFLUENT BUILD-UP IN A PUMPING EXHAUST SYSTEM

XAVIER, ANTONIO

GOZA, STEVEN

CHANDRASEKHARAN, RAMESH

LAVOIE, ADRIEN

NESMITH, JOSEPH

LAM RESEARCH CORPORATION

39719/1

01-Mar-2018

(X0) 15253301: SELECTIVE ATOMIC LAYER DEPOSITION FOR GAPFILL USING SACRIFICIAL UNDERLAYER

(A1) 20180061628: SELECTIVE ATOMIC LAYER DEPOSITION FOR GAPFILL USING SACRIFICIAL UNDERLAYER

OU, FUNG SUONG

KUMAR, PURUSHOTTAM

LAVOIE, ADRIEN

KARIM, ISHTAK

QIAN, JUN

LAM RESEARCH CORPORATION

39606/129

01-Mar-2018

(X0) 15253546: HIGH DRY ETCH RATE MATERIALS FOR SEMICONDUCTOR PATTERNING APPLICATIONS

(A1) 20180061650: HIGH DRY ETCH RATE MATERIALS FOR SEMICONDUCTOR PATTERNING APPLICATIONS

MAHOROWALA, ARPAN

KARIM, ISHTAK

KUMAR, PURUSHOTTAM

SWAMINATHAN, SHANKAR

LAVOIE, ADRIEN

LAM RESEARCH CORPORATION

39607/171

13-Feb-2018

(X0) 15224347: PLASMA ASSISTED ATOMIC LAYER DEPOSITION OF MULTI-LAYER FILMS FOR PATTERNING APPLICATIONS

(A1) 20160336178: PLASMA ASSISTED ATOMIC LAYER DEPOSITION OF MULTI-LAYER FILMS FOR PATTERNING APPLICATIONS

(B2) 9: PLASMA ASSISTED ATOMIC LAYER DEPOSITION OF MULTI-LAYER FILMS FOR PATTERNING APPLICATIONS

SWAMINATHAN, SHANKAR

PASQUALE, FRANK L.

LAVOIE, ADRIEN

LAM RESEARCH CORPORATION

39317/544

01-Feb-2018

(X0) 15279312: DOPED ALD FILMS FOR SEMICONDUCTOR PATTERNING APPLICATIONS

(A1) 20180033622: DOPED ALD FILMS FOR SEMICONDUCTOR PATTERNING APPLICATIONS

SWAMINATHAN, SHANKAR

PHILLIPS, RICHARD

LAVOIE, ADRIEN

LAM RESEARCH CORPORATION

39885/59