SEARCH RESULTS for assignor:"GAU, TSAI-SHENG"

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(X0) 15996099: Lithographic Technique Incorporating Varied Pattern Materials

(A1) 20180286698: Lithographic Technique Incorporating Varied Pattern Materials

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(X0) 15395310: Directional Patterning Methods

(A1) 20180090370: Directional Patterning Methods

(B2) 1: Directional Patterning Methods

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(X0) 15912177: Via Connection to a Partially Filled Trench

(A1) 20180197750: Via Connection to a Partially Filled Trench

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(X0) 14689288: Lithographic Technique Incorporating Varied Pattern Materials

(A1) 20160307769: Lithographic Technique Incorporating Varied Pattern Materials

(B2) 9: Lithographic Technique Incorporating Varied Pattern Materials

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(X0) 15436729: PHOTOMASK AND METHOD FOR FABRICATING INTEGRATED CIRCUIT

(A1) 20170160633: PHOTOMASK AND METHOD FOR FABRICATING INTEGRATED CIRCUIT

(B2) 9: PHOTOMASK AND METHOD FOR FABRICATING INTEGRATED CIRCUIT

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(X0) 15852129: Methods for Integrated Circuit Design and Fabrication

(A1) 20180138042: Methods for Integrated Circuit Design and Fabrication

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(X0) 14970242: Via Connection to a Partially Filled Trench

(A1) 20170170110: Via Connection to a Partially Filled Trench

(B2) 9: Via Connection to a Partially Filled Trench

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(X0) 15267341: Mandrel Spacer Patterning in Multi-Pitch Integrated Circuit Manufacturing

(A1) 20170316938: Mandrel Spacer Patterning in Multi-Pitch Integrated Circuit Manufacturing

(B2) 9: Mandrel Spacer Patterning in Multi-Pitch Integrated Circuit Manufacturing