SEARCH RESULTS for assignor:"FANG, ZIWEI"

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(X0) 15197984: METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION

(A1) 20180005869: METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION

(B2) 1: METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION

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(X0) 16016862: METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION

(A1) 20180308765: METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION

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(X0) 15988624: METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR DEVICE

(A1) 20180263684: METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR DEVICE

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(X0) 15395310: Directional Patterning Methods

(A1) 20180090370: Directional Patterning Methods

(B2) 1: Directional Patterning Methods

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(X0) 15062210: FIN-TYPE FIELD EFFECT TRANSISTOR STRUCTURE AND MANUFACTURING METHOD THEREOF

(A1) 20170256539: FIN-TYPE FIELD EFFECT TRANSISTOR STRUCTURE AND MANUFACTURING METHOD THEREOF

(B2) 1: FIN-TYPE FIELD EFFECT TRANSISTOR STRUCTURE AND MANUFACTURING METHOD THEREOF

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(X0) 15602807: METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR DEVICE

(A1) 20180151565: METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR DEVICE

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(X0) 15865012: ION IMPLANTATION METHODS AND STRUCTURES THEREOF

(A1) 20180130715: ION IMPLANTATION METHODS AND STRUCTURES THEREOF

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(X0) 15282981: METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION

(A1) 20180096898: METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION

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(X0) 15803083: Field Effect Transistor Contact with Reduced Contact Resistance

(A1) 20180053763: Field Effect Transistor Contact with Reduced Contact Resistance

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(X0) 13157179: METHOD OF FABRICATING GATE ELCTRODE USING A TREATED HARD MASK

(A1) 20120315733: METHOD OF FABRICATING GATE ELCTRODE USING A TREATED HARD MASK

(B2) 9: METHOD OF FABRICATING GATE ELCTRODE USING A TREATED HARD MASK

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(X0) 15231661: ION IMPLANTATION METHODS AND STRUCTURES THEREOF

(A1) 20160351458: ION IMPLANTATION METHODS AND STRUCTURES THEREOF

(B2) 9: ION IMPLANTATION METHODS AND STRUCTURES THEREOF