SEARCH RESULTS for assignor:"CHANDRASEKHARAN, RAMESH"

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(X0) 15089960: SYSTEMS AND METHODS FOR FREQUENCY MODULATION OF RADIOFREQUENCY POWER SUPPLY FOR CONTROLLING PLASMA INSTABILITY

(A1) 20170141002: SYSTEMS AND METHODS FOR FREQUENCY MODULATION OF RADIOFREQUENCY POWER SUPPLY FOR CONTROLLING PLASMA INSTABILITY

(B2) 9: SYSTEMS AND METHODS FOR FREQUENCY MODULATION OF RADIOFREQUENCY POWER SUPPLY FOR CONTROLLING PLASMA INSTABILITY

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(X0) 14798652: SYSTEMS AND METHODS FOR VAPOR DELIVERY IN A SUBSTRATE PROCESSING SYSTEM

(A1) 20160032453: SYSTEMS AND METHODS FOR VAPOR DELIVERY IN A SUBSTRATE PROCESSING SYSTEM

(B2) 9: SYSTEMS AND METHODS FOR VAPOR DELIVERY IN A SUBSTRATE PROCESSING SYSTEM

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(X0) 15431088: PLANAR SUBSTRATE EDGE CONTACT WITH OPEN VOLUME EQUALIZATION PATHWAYS AND SIDE CONTAINMENT

(A1) 20180122685: PLANAR SUBSTRATE EDGE CONTACT WITH OPEN VOLUME EQUALIZATION PATHWAYS AND SIDE CONTAINMENT

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(X0) 15593187: INTEGRATED DIRECT DIELECTRIC AND METAL DEPOSITION

(A1) 20180108529: INTEGRATED DIRECT DIELECTRIC AND METAL DEPOSITION

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(X0) 15263838: SYSTEMS AND METHODS FOR REDUCING EFFLUENT BUILD-UP IN A PUMPING EXHAUST SYSTEM

(A1) 20180073137: SYSTEMS AND METHODS FOR REDUCING EFFLUENT BUILD-UP IN A PUMPING EXHAUST SYSTEM

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(X0) 15232708: SUPPRESSING INTERFACIAL REACTIONS BY VARYING THE WAFER TEMPERATURE THROUGHOUT DEPOSITION

(A1) 20180047645: SUPPRESSING INTERFACIAL REACTIONS BY VARYING THE WAFER TEMPERATURE THROUGHOUT DEPOSITION

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(X0) 15051886: VARIABLE TEMPERATURE HARDWARE AND METHODS FOR REDUCTION OF WAFER BACKSIDE DEPOSITION

(A1) 20170178898: VARIABLE TEMPERATURE HARDWARE AND METHODS FOR REDUCTION OF WAFER BACKSIDE DEPOSITION

(B2) 9: VARIABLE TEMPERATURE HARDWARE AND METHODS FOR REDUCTION OF WAFER BACKSIDE DEPOSITION