SEARCH RESULTS for assignor:"AUGUSTYNIAK, EDWARD"

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(X0) 15074953: SYSTEMS AND METHODS FOR DETECTION OF PLASMA INSTABILITY BY OPTICAL DIAGNOSIS

(A1) 20170141001: SYSTEMS AND METHODS FOR DETECTION OF PLASMA INSTABILITY BY OPTICAL DIAGNOSIS

(B2) 1: SYSTEMS AND METHODS FOR DETECTION OF PLASMA INSTABILITY BY OPTICAL DIAGNOSIS

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(X0) 14300854: DEFECT CONTROL IN RF PLASMA SUBSTRATE PROCESSING SYSTEMS USING DC BIAS VOLTAGE DURING MOVEMENT OF SUBSTRATES

(A1) 20150357161: DEFECT CONTROL IN RF PLASMA SUBSTRATE PROCESSING SYSTEMS USING DC BIAS VOLTAGE DURING MOVEMENT OF SUBSTRATES

(B2) 1: DEFECT CONTROL IN RF PLASMA SUBSTRATE PROCESSING SYSTEMS USING DC BIAS VOLTAGE DURING MOVEMENT OF SUBSTRATES

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(X0) 14700749: HOLLOW CATHODE DISCHARGE (HCD) SUPPRESSING CAPACITIVELY COUPLED PLASMA ELECTRODE AND GAS DISTRIBUTION FACEPLATE

(A1) 20150345020: HOLLOW CATHODE DISCHARGE (HCD) SUPPRESSING CAPACITIVELY COUPLED PLASMA ELECTRODE AND GAS DISTRIBUTION FACEPLATE

(B2) 1: HOLLOW CATHODE DISCHARGE (HCD) SUPPRESSING CAPACITIVELY COUPLED PLASMA ELECTRODE AND GAS DISTRIBUTION FACEPLATE

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(A1) 20180175819: SYSTEMS AND METHODS FOR PROVIDING SHUNT CANCELLATION OF PARASITIC COMPONENTS IN A PLASMA REACTOR

(X0) 15382409: SYSTEMS AND METHODS FOR PROVIDING SHUNT CANCELLATION OF PARASITIC COMPONENTS IN A PLASMA REACTOR

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(X0) 15089960: SYSTEMS AND METHODS FOR FREQUENCY MODULATION OF RADIOFREQUENCY POWER SUPPLY FOR CONTROLLING PLASMA INSTABILITY

(A1) 20170141002: SYSTEMS AND METHODS FOR FREQUENCY MODULATION OF RADIOFREQUENCY POWER SUPPLY FOR CONTROLLING PLASMA INSTABILITY

(B2) 9: SYSTEMS AND METHODS FOR FREQUENCY MODULATION OF RADIOFREQUENCY POWER SUPPLY FOR CONTROLLING PLASMA INSTABILITY

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(X0) 15130176: MEASURING INDIVIDUAL LAYER THICKNESS DURING MULTI-LAYER DEPOSITION SEMICONDUCTOR PROCESSING

(A1) 20160307812: MEASURING INDIVIDUAL LAYER THICKNESS DURING MULTI-LAYER DEPOSITION SEMICONDUCTOR PROCESSING

(B2) 9: MEASURING INDIVIDUAL LAYER THICKNESS DURING MULTI-LAYER DEPOSITION SEMICONDUCTOR PROCESSING

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(X0) 15640053: CONTROL OF WAFER BOW IN MULTIPLE STATIONS

(A1) 20180025930: CONTROL OF WAFER BOW IN MULTIPLE STATIONS