SEARCH RESULTS for assignee:"VERSUM MATERIALS US, LLC"

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(X0) 15986030: Functionalized Cyclosilazanes as Precursors For High Growth Rate Silicon-Containing Films

(A1) 20180342390: Functionalized Cyclosilazanes as Precursors For High Growth Rate Silicon-Containing Films

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(X0) 15975199: Volatile Dihydropyrazinly and Dihydropyrazine Metal Complexes

(A1) 20180327900: Volatile Dihydropyrazinly and Dihydropyrazine Metal Complexes

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(X0) 15976028: Methods for Depositing Films with Organoaminodisilane Precursors

(A1) 20180294152: Methods for Depositing Films with Organoaminodisilane Precursors

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(X0) 15764751: METHODS FOR DEPOSITING A CONFORMAL METAL OR METALLOID SILICON NITRIDE FILM

(A1) 20180274097: METHODS FOR DEPOSITING A CONFORMAL METAL OR METALLOID SILICON NITRIDE FILM

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(X0) 15954906: Method and Composition for Providing Pore Sealing Layer on Porous Low Dielectric Constant Films

(A1) 20180277360: Method and Composition for Providing Pore Sealing Layer on Porous Low Dielectric Constant Films

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(X0) 15914968: Formulation for Deposition of Silicon Doped Hafnium Oxide as Ferroelectric Materials

(A1) 20180269057: Formulation for Deposition of Silicon Doped Hafnium Oxide as Ferroelectric Materials

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(X0) 15914962: Formulation for Deposition of Silicon Doped Hafnium Oxide as Ferroelectric Materials

(A1) 20180265967: Formulation for Deposition of Silicon Doped Hafnium Oxide as Ferroelectric Materials

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(X0) 15461999: Organoaminodisilane Precursors and Methods for Depositing Films Comprising Same

(A1) 20170183502: Organoaminodisilane Precursors and Methods for Depositing Films Comprising Same

(B2) 1: Organoaminodisilane Precursors and Methods for Depositing Films Comprising Same

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(X0) 15865585: TiN Hard Mask and Etch Residue Removal

(A1) 20180251711: TiN Hard Mask and Etch Residue Removal

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(X0) 15757805: METHODS FOR DEPOSITING A CONFORMAL METAL OR METALLOID SILICON NITRIDE FILM AND RESULTANT FILMS

(A1) 20180245215: METHODS FOR DEPOSITING A CONFORMAL METAL OR METALLOID SILICON NITRIDE FILM AND RESULTANT FILMS

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(X0) 15901317: Chemical Mechanical Planarization of Films Comprising Elemental Silicon

(A1) 20180244955: Chemical Mechanical Planarization of Films Comprising Elemental Silicon

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(X0) 15884013: Organoamino-Polysiloxanes For Deposition Of Silicon-Containing Films

(A1) 20180223428: Organoamino-Polysiloxanes For Deposition Of Silicon-Containing Films

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(X0) 15883815: Organoamino-Functionalized Linear And Cyclic Oligosiloxanes For Deposition Of Silicon-Containing Films

(A1) 20180223047: Organoamino-Functionalized Linear And Cyclic Oligosiloxanes For Deposition Of Silicon-Containing Films

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(X0) 15872620: Etching Solution For Tungsten And GST Films

(A1) 20180209049: Etching Solution For Tungsten And GST Films

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(X0) 15459389: Methods for Depositing Films with Organoaminodisilane Precursors

(A1) 20170186605: Methods for Depositing Films with Organoaminodisilane Precursors

(B2) 9: Methods for Depositing Films with Organoaminodisilane Precursors

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(X0) 15790931: DISUBSTITUTED ALKYNE DICOBALT HEXACARBONYL COMPOUNDS, METHOD OF MAKING AND METHOD OF USE THEREOF

(A1) 20180134738: DISUBSTITUTED ALKYNE DICOBALT HEXACARBONYL COMPOUNDS, METHOD OF MAKING AND METHOD OF USE THEREOF

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(X0) 15792092: COBALT COMPOUNDS, METHOD OF MAKING AND METHOD OF USE THEREOF

(A1) 20180135174: COBALT COMPOUNDS, METHOD OF MAKING AND METHOD OF USE THEREOF

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(X0) 15698794: Compositions and Methods for the Deposition of Silicon Oxide Films

(A1) 20180127592: Compositions and Methods for the Deposition of Silicon Oxide Films