SEARCH RESULTS for assignee:"ASML NETHERLANDS B.V."
Showing 1 to 20 of 189 results
| Last Update | Patent(s) | Assignor(s) | Orig. Assignee(s) | Assignee(s) | Reel/Frame |
|---|---|---|---|---|---|
| 14-Jun-2018 |
(X0) 1: THERMAL CONDITIONING UNIT, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD (A1) 2: THERMAL CONDITIONING UNIT, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
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| 14-Jun-2018 |
(X0) 1: THERMAL CONDITIONING UNIT, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD (A1) 2: THERMAL CONDITIONING UNIT, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
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| 14-Jun-2018 |
(X0) 1: IMPRINT LITHOGRAPHY (A1) 2: IMPRINT LITHOGRAPHY |
KRUIJT-STEGEMAN, YVONNE WENDELA |
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| 14-Jun-2018 |
(X0) 1: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD (A1) 2: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
WESTERLAKEN, JAN STEVEN CHRISTIAAN |
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| 14-Jun-2018 |
(X0) 1: Methods and Apparatus for Calculating Electromagnetic Scattering Properties of a Structure and for Reconstruction of Approximate Structures (A1) 2: Methods and Apparatus for Calculating Electromagnetic Scattering Properties of a Structure and for Reconstruction of Approximate Structures |
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| 31-May-2018 |
(X0) 1: LITHOGRAPHIC APPARATUS, OBJECT POSITIONING SYSTEM AND DEVICE MANUFACTURING METHOD (A1) 2: LITHOGRAPHIC APPARATUS, OBJECT POSITIONING SYSTEM AND DEVICE MANUFACTURING METHOD |
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| 31-May-2018 |
(X0) 1: LITHOGRAPHIC APPARATUS AND METHOD FOR LOADING A SUBSTRATE (A1) 2: LITHOGRAPHIC APPARATUS AND METHOD FOR LOADING A SUBSTRATE |
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| 31-May-2018 |
(X0) 1: LITHOGRAPHIC APPARATUS AND METHOD FOR LOADING A SUBSTRATE (A1) 2: LITHOGRAPHIC APPARATUS AND METHOD FOR LOADING A SUBSTRATE |
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| 29-May-2018 |
(X0) 1: Method For Controlling A Distance Between Two Objects, Inspection Apparatus And Method (A1) 2: Method For Controlling A Distance Between Two Objects, Inspection Apparatus And Method (B2) 9: Method For Controlling A Distance Between Two Objects, Inspection Apparatus And Method |
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| 29-May-2018 |
(X0) 1: Method and Apparatus for Generating Radiation (A1) 2: Method and Apparatus for Generating Radiation |
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| 29-May-2018 |
(X0) 1: Rapid Exchange Device for Lithography Reticles (A1) 2: Rapid Exchange Device for Lithography Reticles |
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| 29-May-2018 |
(X0) 1: LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ASSOCIATED DATA PROCESSING APPARATUS AND COMPUTER PROGRAM PRODUCT (A1) 2: LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ASSOCIATED DATA PROCESSING APPARATUS AND COMPUTER PROGRAM PRODUCT |
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| 29-May-2018 |
(X0) 1: LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ASSOCIATED DATA PROCESSING APPARATUS AND COMPUTER PROGRAM PRODUCT (A1) 2: LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ASSOCIATED DATA PROCESSING APPARATUS AND COMPUTER PROGRAM PRODUCT |
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| 29-May-2018 |
(X0) 1: Radiation Collector, Radiation Source and Lithographic Apparatus (A1) 2: Radiation Collector, Radiation Source and Lithographic Apparatus (B2) 9: Radiation Collector, Radiation Source and Lithographic Apparatus |
BEERENS, RUUD ANTONIUS CATHARINA MARIA DONDERS, SJOERD NICOLAAS LAMBERTUS FRIJNS, OLAV WALDEMAR VLADIMIR |
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| 29-May-2018 |
(X0) 1: Method For Compensating for an Exposure Error, a Device Manufacturing Method, a Substrate Table, a Lithographic Apparatus, a Control System, a Method for Measuring Reflectivity and a Method for Measuring a Dose of EUV Radiation (A1) 2: Method For Compensating for an Exposure Error, a Device Manufacturing Method, a Substrate Table, a Lithographic Apparatus, a Control System, a Method for Measuring Reflectivity and a Method for Measuring a Dose of EUV Radiation |
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| 23-May-2018 |
(X0) 1: CORRECTION USING STACK DIFFERENCE (A1) 2: CORRECTION USING STACK DIFFERENCE |
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| 22-May-2018 |
(X0) 1: Method and Apparatus for Measuring a Structure on a Substrate, Computer Program Products for Implementing Such Methods and Apparatus (A1) 2: Method and Apparatus for Measuring a Structure on a Substrate, Computer Program Products for Implementing Such Methods and Apparatus |
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| 22-May-2018 |
(X0) 1: SYSTEMS AND METHODS FOR CONTROLLING EUV ENERGY GENERATION USING PULSE INTENSITY (A1) 2: SYSTEMS AND METHODS FOR CONTROLLING EUV ENERGY GENERATION USING PULSE INTENSITY (B2) 9: SYSTEMS AND METHODS FOR CONTROLLING EUV ENERGY GENERATION USING PULSE INTENSITY |
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| 22-May-2018 |
(X0) 1: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD (A1) 2: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD (B2) 9: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
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| 22-May-2018 |
(X0) 1: SUPPORT DEVICE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD (A1) 2: SUPPORT DEVICE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD (B2) 9: SUPPORT DEVICE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
DE HOON, CORNELIUS ADRIANUS LAMBERTUS |