SEARCH RESULTS for assignee:"ASML NETHERLANDS B.V."

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(X0) 15547713: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

(A1) 20180017879: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

(B2) 1: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

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(X0) 15547713: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

(A1) 20180017879: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

(B2) 1: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

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(X0) 15838634: FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

(A1) 20180101102: FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

(B2) 1: FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

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(X0) 15824686: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

(A1) 20180081285: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

(B2) 1: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

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(X0) 15913253: Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method

(A1) 20180195857: Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method

(B2) 1: Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method

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(X0) 16051697: METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

(A1) 20190049859: METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

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(X0) 16078699: WAVELENGTH COMBINING OF MULTIPLE SOURCE

(A1) 20190049864: WAVELENGTH COMBINING OF MULTIPLE SOURCE

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(X0) 16079169: VIBRATION ISOLATOR, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

(A1) 20190049852: VIBRATION ISOLATOR, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

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(X0) 16069678: POSITION SENSING ARRANGEMENT AND LITHOGRAPHIC APPARATUS INCLUDING SUCH AN ARRANGEMENT, POSITION SENSING METHOD AND DEVICE MANUFACTURING METHOD

(A1) 20190049866: POSITION SENSING ARRANGEMENT AND LITHOGRAPHIC APPARATUS INCLUDING SUCH AN ARRANGEMENT, POSITION SENSING METHOD AND DEVICE MANUFACTURING METHOD

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(X0) 15523938: RADIATION BEAM APPARATUS

(A1) 20180314164: RADIATION BEAM APPARATUS

(B2) 1: RADIATION BEAM APPARATUS

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(X0) 14543326: METHODS AND SYSTEM FOR MODEL-BASED GENERIC MATCHING AND TUNING

(A1) 20150074619: METHODS AND SYSTEM FOR MODEL-BASED GENERIC MATCHING AND TUNING

(B2) 1: METHODS AND SYSTEM FOR MODEL-BASED GENERIC MATCHING AND TUNING

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(X0) 15857368: VACUUM SYSTEM FOR IMMERSION PHOTOLITHOGRAPHY

(A1) 20180120715: VACUUM SYSTEM FOR IMMERSION PHOTOLITHOGRAPHY

(B2) 1: VACUUM SYSTEM FOR IMMERSION PHOTOLITHOGRAPHY

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(X0) 16060837: A MEMBRANE ASSEMBLY

(A1) 20180373141: A MEMBRANE ASSEMBLY

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(X0) 16061947: TOPOGRAPHY MEASUREMENT SYSTEM

(A1) 20180373171: TOPOGRAPHY MEASUREMENT SYSTEM

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(X0) 16061947: TOPOGRAPHY MEASUREMENT SYSTEM

(A1) 20180373171: TOPOGRAPHY MEASUREMENT SYSTEM

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(X0) 16062735: LITHOGRAPHIC APPARATUS HAVING AN ACTIVE BASE FRAME SUPPORT

(A1) 20180373156: LITHOGRAPHIC APPARATUS HAVING AN ACTIVE BASE FRAME SUPPORT

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(X0) 16062919: METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY FOR EUV LITHOGRAPHY, A MEMBRANE ASSEMBLY, A LITHOGRAPHIC APPARATUS, AND A DEVICE MANUFACTURING METHOD

(A1) 20180373170: METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY FOR EUV LITHOGRAPHY, A MEMBRANE ASSEMBLY, A LITHOGRAPHIC APPARATUS, AND A DEVICE MANUFACTURING METHOD

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