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19-Feb-2019

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APPLIED MATERIALS, INC.

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33851/992

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19-Feb-2019

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APPLIED MATERIALS, INC.

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34508/918

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19-Feb-2019

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(X0) 14315794: SUBSTRATE SUPPORT RING FOR MORE UNIFORM LAYER THICKNESS

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PAN, HENG, HAWRYLCHAK, LARA, OLSEN, CHRISTOPHER S.

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APPLIED MATERIALS, INC.

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34871/769

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19-Feb-2019

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(X0) 14612263: INLINE DPS CHAMBER HARDWARE DESIGN TO ENABLE AXIS SYMMETRY FOR IMPROVED FLOW CONDUCTANCE AND UNIFORMITY

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NGUYEN, ANDREW, SARODE VISHWANATH, YOGANANDA, CHO, TOM K.

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APPLIED MATERIALS, INC.

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37899/64

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19-Feb-2019

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(X0) 15046270: DETERMINATION OF GAIN FOR EDDY CURRENT SENSOR

(A1) 20160158908: DETERMINATION OF GAIN FOR EDDY CURRENT SENSOR

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XU, KUN , SHEN, SHIH-HAUR , SWEDEK, BOGUSLAW A., CARLSSON, INGEMAR , BENNETT, DOYLE E., TU, WEN-CHIANG , IRAVANI, HASSAN G., LIU, TZU-YU

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APPLIED MATERIALS, INC.

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38912/792

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19-Feb-2019

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(X0) 15167740: SYSTEM AND METHOD FOR MANUFACTURING PLANARIZED EXTREME ULTRAVIOLET LITHOGRAPHY BLANK

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BEASLEY, CARA , HOFMANN, RALF , FOAD, MAJEED , MICHAELSON, TIMOTHY

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APPLIED MATERIALS, INC.

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40464/782

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(X0) 15334431: ADVANCED COATING METHOD AND MATERIALS TO PREVENT HDP-CVD CHAMBER ARCING

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ZHANG, LIN, LU, XUESONG, LE, ANDY, OH, JANG SEOK

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APPLIED MATERIALS, INC.

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40909/89

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19-Feb-2019

Patent(s)

(X0) 15334431: ADVANCED COATING METHOD AND MATERIALS TO PREVENT HDP-CVD CHAMBER ARCING

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ZHANG, LIN, LU, XUESONG, LE, ANDREW V., OH, JANG SEOK

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APPLIED MATERIALS, INC.

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44157/177

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19-Feb-2019

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(X0) 15104461: SOURCE RF POWER SPLIT INNER COIL TO IMPROVE BCD AND ETCH DEPTH PERFORMANCE

(A1) 20170200585: SOURCE RF POWER SPLIT INNER COIL TO IMPROVE BCD AND ETCH DEPTH PERFORMANCE

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WANG, RONGPING, REN, RUIZHE, FARR, JON C., MANGALORE, CHETHAN, DEMONTE, PETER, BALAKRISHNA, PARTHIBAN

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APPLIED MATERIALS, INC.

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19-Feb-2019

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(X0) 15840900: METHOD OF RECONSTITUTED SUBSTRATE FORMATION FOR ADVANCED PACKAGING APPLICATIONS

(A1) 20180374718: METHOD OF RECONSTITUTED SUBSTRATE FORMATION FOR ADVANCED PACKAGING APPLICATIONS

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CHEN, HAN-WEN, VERHAVERBEKE, STEVEN, GOUK, ROMAN, SEE, GUAN HUEI, GU, YU, SUNDARRAJAN, ARVIND, CHO, KYUIL, NEIKIRK, COLIN COSTANO, FU, BOYI

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APPLIED MATERIALS, INC.

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48342/576

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18-Feb-2019

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(X0) 16000431: Methods Of Lowering Wordline Resistance

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CHEN, YIHONG, WU, YONG, CHIN, CHIA CHENG, LU, XINLIANG, GANDIKOTA, SRINIVAS, DUAN, ZIQING, MALLICK, ABHIJIT BASU

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APPLIED MATERIALS, INC.

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48347/897

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18-Feb-2019

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(X0) 15882454: ACCOMMODATING IMPERFECTLY ALIGNED MEMORY HOLES

(A1) 20180226425: ACCOMMODATING IMPERFECTLY ALIGNED MEMORY HOLES

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APPLIED MATERIALS, INC.

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43358/527

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(X0) 15671909: MULTI-PLATE FACEPLATE FOR A PROCESSING CHAMBER

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SRIKANTAIAH, DEEPAK DODDABELAVANGALA, TULSHIBAGWALE, SHESHRAJ L., SINGH, SARAVJEET, TAM, ALEXANDER

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APPLIED MATERIALS, INC.

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44154/22

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14-Feb-2019

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(X0) 15585842: FLUORESCENCE BASED THERMOMETRY FOR PACKAGING APPLICATIONS

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APPLIED MATERIALS, INC.

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44533/5

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14-Feb-2019

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(X0) 15847339: SHOWERHEAD AND PROCESS CHAMBER INCORPORATING SAME

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SANCHEZ, MARIO DAN, RASHEED, MUHAMMAD M.

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APPLIED MATERIALS, INC.

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45684/55

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14-Feb-2019

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(X0) 15879371: Microwave Reactor For Deposition or Treatment of Carbon Compounds

(A1) 20190051495: Microwave Reactor For Deposition or Treatment of Carbon Compounds

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LIANG, QIWEI , ZHOU, JIE , KHAN, ADIB M., PISHARODY, GAUTAM , CHEN, GUANNAN , YING, CHENTSAU , NEMANI, SRINIVAS D.

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APPLIED MATERIALS, INC.

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45737/199

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14-Feb-2019

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(X0) 15675457: TEMPERATURE CONTROL FOR ADDITIVE MANUFACTURING

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ISHIKAWA, DAVID MASAYUKI, EGAN, TODD J., STEFFAS, PAUL J.

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APPLIED MATERIALS, INC.

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46885/137

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14-Feb-2019

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(X0) 16121844: SUBSTRATE SUPPORT WITH SYMMETRICAL FEED STRUCTURE

(A1) 20190051551: SUBSTRATE SUPPORT WITH SYMMETRICAL FEED STRUCTURE

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LIN, XING, BUCHBERGER, DOUGLAS A., JR., ZHOU, XIAOPING, NGUYEN, ANDREW, SHEYNER, ANCHEL

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APPLIED MATERIALS, INC.

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47014/475

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14-Feb-2019

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(X0) 16059608: DISTRIBUTED ELECTRODE ARRAY FOR PLASMA PROCESSING

(A1) 20190051496: DISTRIBUTED ELECTRODE ARRAY FOR PLASMA PROCESSING

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COLLINS, KENNETH S., RICE, MICHAEL R., RAMASWAMY, KARTIK, CARDUCCI, JAMES D., GUO, YUE, REGELMAN, OLGA

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APPLIED MATERIALS, INC.

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47125/798

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14-Feb-2019

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(X0) 16154330: METHOD FOR GRADED ANTI-REFLECTIVE COATINGS BY PHYSICAL VAPOR DEPOSITION

(A1) 20190051768: METHOD FOR GRADED ANTI-REFLECTIVE COATINGS BY PHYSICAL VAPOR DEPOSITION

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CAO, YONG, DIEHL, DANIEL LEE, WANG, RONGJUN, TANG, XIANMIN, CHEN, TAI-CHOU PAPO, XU, TINGJUN

Assignee(s)

APPLIED MATERIALS, INC.