SEARCH RESULTS for APPLIED MATERIALS, INC.

Recent Patent Assignments Patent Assignments - (Total found: 259)

Last Update Patent(s) Assignor(s) Orig. Assignee(s) Assignee(s) Reel/Frame
13-Dec-2017

(X0) 15186247: SURFACE PROCESSING IN ADDITIVE MANUFACTURING WITH LASER AND GAS FLOW

(A1) 20160368077: SURFACE PROCESSING IN ADDITIVE MANUFACTURING WITH LASER AND GAS FLOW

SWAMINATHAN, BHARATH

NG, ERIC

PATIBANDLA, NAG B.

NG, HOU T.

JOSHI, AJEY M.

KUMAR, ASHAVANI

FREY, BERNARD

KRISHNAN, KASIRAMAN

APPLIED MATERIALS, INC.

44372/425

08-Dec-2017

(X0) 15462507: INDUCTIVE PLASMA SOURCE WITH METALLIC SHOWER HEAD USING B-FIELD CONCENTRATOR

(A1) 20170194128: INDUCTIVE PLASMA SOURCE WITH METALLIC SHOWER HEAD USING B-FIELD CONCENTRATOR

LAI, CANFENG

TOBIN, JEFFREY

PORSHNEV, PETER I.

MARIN, JOSE ANTONIO

APPLIED MATERIALS, INC.

44322/174

08-Dec-2017

(X0) 15417865: SEMICONDUCTOR PROCESSING CHAMBER

(A1) 20170294325: SEMICONDUCTOR PROCESSING CHAMBER

HUNTER, AARON MUIR

BEHDJAT, MEHRAN

MERCHANT, NIRAJ

MCALLISTER, DOUGLAS R.

IU, DONGMING

CHAN, KONG LUNG SAMUEL

HAWRYLCHAK, LARA

APPLIED MATERIALS, INC.

44321/684

06-Dec-2017

(X0) 15494892: Enhanced Spatial ALD Of Metals Through Controlled Precursor Mixing

(A1) 20170306490: Enhanced Spatial ALD Of Metals Through Controlled Precursor Mixing

CHAN, KELVIN

CHEN, YIHONG

LEE, JARED AHMAD

GRIFFIN, KEVIN

GANDIKOTA, SRINIVAS

YUDOVSKY, JOSEPH

SRIRAM, MANDYAM

APPLIED MATERIALS, INC.

44296/756

04-Dec-2017

(X0) 14824229: METHOD AND APPARATUS OF PROCESSING WAFERS WITH COMPRESSIVE OR TENSILE STRESS AT ELEVATED TEMPERATURES IN A PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SYSTEM

(A1) 20160049323: METHOD AND APPARATUS OF PROCESSING WAFERS WITH COMPRESSIVE OR TENSILE STRESS AT ELEVATED TEMPERATURES IN A PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SYSTEM

YE, ZHENG JOHN

PINSON, JAY D., II

HANAWA, HIROJI

ZHOU, JIANHUA

LIN, XING

DUAN, REN-GUAN

LEE, KWANGDUK DOUGLAS

KIM, BOK HOEN

BEHERA, SWAYAMBHU P.

HA, SUNGWON

BALASUBRAMANIAN, GANESH

ROCHA- ALVAREZ, JUAN CARLOS

KULSHRESHTHA, PRASHANT KUMAR

FOSTER, JASON K.

SRINIVASAN, MUKUND

HALLER, UWE P.

PONNEKANTI, HARI K.

APPLIED MATERIALS, INC.

44274/859

01-Dec-2017

(X0) 15276526: CHAMBER LEAK AND GAS CONTAIMINATION DETECTION

(A1) 20170107610: CHAMBER LEAK AND GAS CONTAIMINATION DETECTION

NA, SHUO JULIA

SMITH, PATRICK L.

ILIOPOULOS, ILIAS

JIANG, SONGFU

ZHANG, BO

APPLIED MATERIALS, INC.

44268/807

01-Dec-2017

(X0) 15457016: APPARATUS FOR COST-EFFECTIVE CONVERSION OF UNSUPERVISED FAULT DETECTION (FD) SYSTEM TO SUPERVISED FD SYSTEM

(A1) 20170261971: APPARATUS FOR COST-EFFECTIVE CONVERSION OF UNSUPERVISED FAULT DETECTION (FD) SYSTEM TO SUPERVISED FD SYSTEM

SCHULZE, BRADLEY D.

PARIKH, SUKETU ARUN

ISKANDAR, JIMMY

PATEL, JIGAR BHADRIKLAL

APPLIED MATERIALS, INC.

44268/705

01-Dec-2017

(X0) 15486548: Micro-Volume Deposition Chamber

(A1) 20170298509: Micro-Volume Deposition Chamber

DUBOIS, DALE R.

JANAKIRAMAN, KARTHIK

CHUC, KIEN N.

APPLIED MATERIALS, INC.

44256/855

01-Dec-2017

(X0) 15474446: Apparatus And Method For Providing A Uniform Flow Of Gas

(A1) 20170283947: Apparatus And Method For Providing A Uniform Flow Of Gas

RASHEED, MUHAMMAD M.

JALLEPALLY, RAVI

DURUKAN, ILKER

APPLIED MATERIALS, INC.

44256/712

30-Nov-2017

(X0) 15610280: SEMICONDUCTOR DEVICE SEARCH AND CLASSIFICATION

(A1) 20170343999: SEMICONDUCTOR DEVICE SEARCH AND CLASSIFICATION

ISKANDAR, JIMMY

ARMACOST, MICHAEL D.

HAO, HENG

APPLIED MATERIALS, INC.

43886/575

30-Nov-2017

(X0) 15679099: SUBSTRATE SUPPORT ASSEMBLY

(A1) 20170345691: SUBSTRATE SUPPORT ASSEMBLY

PARKHE, VIJAY D.

NARENDRNATH, KADTHALA RAMAYA

APPLIED MATERIALS, INC.

43312/300

30-Nov-2017

(X0) 15399419: EVAPORATION SOURCE FOR ORGANIC MATERIAL, DEPOSITION APPARATUS FOR DEPOSITING ORGANIC MATERIALS IN A VACUUM CHAMBER HAVING AN EVAPORATION SOURCE FOR ORGANIC MATERIAL, AND METHOD FOR EVAPORATING ORGANIC MATERIAL

(A1) 20170346044: EVAPORATION SOURCE FOR ORGANIC MATERIAL, DEPOSITION APPARATUS FOR DEPOSITING ORGANIC MATERIALS IN A VACUUM CHAMBER HAVING AN EVAPORATION SOURCE FOR ORGANIC MATERIAL, AND METHOD FOR EVAPORATING ORGANIC MATERIAL

APPLIED MATERIALS GMBH & CO. KG

APPLIED MATERIALS, INC.

40989/784

30-Nov-2017

(X0) 15495187: Non-Contact Sheet Resistance Measurement of Barrier and/or Seed Layers Prior to Electroplating

(A1) 20170226655: Non-Contact Sheet Resistance Measurement of Barrier and/or Seed Layers Prior to Electroplating

RAVID, ABRAHAM

DZILNO, DMITRY A.

EGAN, TODD J.

MILLER, ROBERT O.

APPLIED MATERIALS, INC.

44237/688

30-Nov-2017

(X0) 15604317: NON-CONTACT TEMPERATURE MEASUREMENT BY DUAL-WAVELENGTH SHIFT IN BREWSTER'S ANGLE

(A1) 20170343424: NON-CONTACT TEMPERATURE MEASUREMENT BY DUAL-WAVELENGTH SHIFT IN BREWSTER'S ANGLE

MOFFITT, THEODORE P.

APURVA, NAMAN

APPLIED MATERIALS, INC.

42510/724

30-Nov-2017

(X0) 15163097: PLATING POWER SUPPLY WITH HEADROOM CONTROL AND ETHERCAT INTERFACE

(A1) 20170342589: PLATING POWER SUPPLY WITH HEADROOM CONTROL AND ETHERCAT INTERFACE

CUMMINGS, CHARLES A.

BORJESSON, MIKAEL R.

APPLIED MATERIALS, INC.

38706/578

30-Nov-2017

(X0) 15399419: EVAPORATION SOURCE FOR ORGANIC MATERIAL, DEPOSITION APPARATUS FOR DEPOSITING ORGANIC MATERIALS IN A VACUUM CHAMBER HAVING AN EVAPORATION SOURCE FOR ORGANIC MATERIAL, AND METHOD FOR EVAPORATING ORGANIC MATERIAL

(A1) 20170346044: EVAPORATION SOURCE FOR ORGANIC MATERIAL, DEPOSITION APPARATUS FOR DEPOSITING ORGANIC MATERIALS IN A VACUUM CHAMBER HAVING AN EVAPORATION SOURCE FOR ORGANIC MATERIAL, AND METHOD FOR EVAPORATING ORGANIC MATERIAL

HAAS, DIETER

APPLIED MATERIALS, INC.

40989/895

30-Nov-2017

(X0) 15677929: APPARATUS AND METHODS FOR REDUCING PARTICLES IN SEMICONDUCTOR PROCESS CHAMBERS

(A1) 20170345623: APPARATUS AND METHODS FOR REDUCING PARTICLES IN SEMICONDUCTOR PROCESS CHAMBERS

NGUYEN, ANDREW

HOWARD, BRADLEY

RAUF, SHAHID

BALAKRISHNA, AJIT

CHO, TOM K.

COLLINS, KENNETH S.

KUMAR, ANAND

WILLWERTH, MICHAEL D.

VISHWANATH, YOGANANDA SARODE

APPLIED MATERIALS, INC.

43577/280

30-Nov-2017

(X0) 15337781: SELF-ALIGNED SHIELDING OF SILICON OXIDE

(A1) 20170148642: SELF-ALIGNED SHIELDING OF SILICON OXIDE

WANG, FEI

KOROLIK, MIKHAIL

INGLE, NITIN K.

WANG, ANCHUAN

VISSER, ROBERT JAN

APPLIED MATERIALS, INC.

44234/322

30-Nov-2017

(X0) 15444864: Amorphous Layer Extreme Ultraviolet Lithography Blank, And Manufacturing And Lithography Systems Therefor

(A1) 20170168383: Amorphous Layer Extreme Ultraviolet Lithography Blank, And Manufacturing And Lithography Systems Therefor

HOFMANN, RALF

MORAES, KEVIN

APPLIED MATERIALS, INC.

44246/355

30-Nov-2017

(X0) 15658266: PLASMA POISONING TO ENABLE SELECTIVE DEPOSITION

(A1) 20170323778: PLASMA POISONING TO ENABLE SELECTIVE DEPOSITION

GODET, LUDOVIC

NEMANI, SRINIVAS D.

KAUFMAN-OSBORN, TOBIN

APPLIED MATERIALS, INC.

44238/245

30-Nov-2017

(X0) 15606249: ELECTROSTATIC CHUCK IMPEDANCE EVALUATION

(A1) 20170345698: ELECTROSTATIC CHUCK IMPEDANCE EVALUATION

HAMMOND, EDWARD P., IV

YE, ZHENG JOHN

KHAJA, ABDUL AZIZ

APPLIED MATERIALS, INC.

42665/650

30-Nov-2017

(X0) 15675825: VISUAL FEEDBACK FOR PROCESS CONTROL IN RTP CHAMBERS

(A1) 20170345693: VISUAL FEEDBACK FOR PROCESS CONTROL IN RTP CHAMBERS

VELLORE, KIM

KANAWADE, DINESH

MOFFATT, STEPHEN

MILLER, AARON

TERTITSKI, LEONID M.

TAM, NORMAN L.

LIU, MICHAEL

FOX, COLIN

APPLIED MATERIALS, INC.

43277/722

30-Nov-2017

(X0) 15212485: DYNAMIC CONTROL BAND FOR RF PLASMA CURRENT RATIO CONTROL

(A1) 20170347441: DYNAMIC CONTROL BAND FOR RF PLASMA CURRENT RATIO CONTROL

LERAY, GARY

APPLIED MATERIALS, INC.

39498/700

30-Nov-2017

(X0) 15165930: PROCESSING CHAMBER WITH IRRADIANCE CURING LENS

(A1) 20170345649: PROCESSING CHAMBER WITH IRRADIANCE CURING LENS

TREJO, ORLANDO

SANKARAKRISHNAN, RAMPRAKASH

GUNG, TZA-JING

APPLIED MATERIALS, INC.

39020/724

23-Nov-2017

(X0) 15159478: SYSTEMS AND METHODS FOR IMPROVED SEMICONDUCTOR ETCHING AND COMPONENT PROTECTION

(A1) 20170338133: SYSTEMS AND METHODS FOR IMPROVED SEMICONDUCTOR ETCHING AND COMPONENT PROTECTION

TAN, TIEN FAK

LOH, LOK KEE

LUBOMIRSKY, DMITRY

JUNG, SOONWOOK

CHOY, MARTIN YUE

PARK, SOONAM

APPLIED MATERIALS, INC.

39274/873

23-Nov-2017

(X0) 15674346: ELECTROPLATING APPARATUS WITH CURRENT CROWDING ADAPTED CONTACT RING SEAL AND THIEF ELECTRODE

(A1) 20170335484: ELECTROPLATING APPARATUS WITH CURRENT CROWDING ADAPTED CONTACT RING SEAL AND THIEF ELECTRODE

WILSON, GREGORY J.

MCHUGH, PAUL R.

APPLIED MATERIALS, INC.

43264/181

23-Nov-2017

(X0) 15157076: NON-SHADOW FRAME PLASMA PROCESSING CHAMBER

(A1) 20170335459: NON-SHADOW FRAME PLASMA PROCESSING CHAMBER

ZHAO, LAI

WANG, DAPENG

APPLIED MATERIALS, INC.

43705/411

23-Nov-2017

(X0) 15492928: GAS DISTRIBUTION SHOWERHEAD FOR SEMICONDUCTOR PROCESSING

(A1) 20170335456: GAS DISTRIBUTION SHOWERHEAD FOR SEMICONDUCTOR PROCESSING

NGUYEN, ANH N.

LUBOMIRSKY, DMITRY

SAMIR, MEHMET TUGRUL

APPLIED MATERIALS, INC.

43044/19

23-Nov-2017

(X0) 15668026: STRUCTURE FOR RELAXED SIGE BUFFERS INCLUDING METHOD AND APPARATUS FOR FORMING

(A1) 20170335444: STRUCTURE FOR RELAXED SIGE BUFFERS INCLUDING METHOD AND APPARATUS FOR FORMING

YE, ZHIYUAN

SANCHEZ, ERROL ANTONIO C.

BAN, KEUN-YONG

BAO, XINYU

APPLIED MATERIALS, INC.

43187/929

23-Nov-2017

(X0) 15159530: SYSTEMS AND METHODS FOR IMPROVED SEMICONDUCTOR ETCHING AND COMPONENT PROTECTION

(A1) 20170338134: SYSTEMS AND METHODS FOR IMPROVED SEMICONDUCTOR ETCHING AND COMPONENT PROTECTION

TAN, TIEN FAK

LOH, LOK KEE

LUBOMIRSKY, DMITRY

JUNG, SOONWOOK

CHOY, MARTIN YUE

PARK, SOONAM

APPLIED MATERIALS, INC.

39275/59

23-Nov-2017

(X0) 15673801: THERMAL COUPLED QUARTZ DOME HEAT SINK

(A1) 20170338135: THERMAL COUPLED QUARTZ DOME HEAT SINK

RANISH, JOSEPH M.

SAMIR, MEHMET TUGRUL

BRILLHART, PAUL

APPLIED MATERIALS, INC.

43260/280

23-Nov-2017

(X0) 15157076: NON-SHADOW FRAME PLASMA PROCESSING CHAMBER

(A1) 20170335459: NON-SHADOW FRAME PLASMA PROCESSING CHAMBER

CHOI, YOUNG-JIN

PARK, BEOM SOO

LEE, DONGSUH

STERLING, WILLIAM NORMAN

TINER, ROBIN L.

KURITA, SHINICHI

ANWAR, SUHAIL

CHOI, SOO YOUNG

CUI, YI

APPLIED MATERIALS, INC.

39125/620

23-Nov-2017

(X0) 15161783: TWO-STEP FLUORINE RADICAL ETCH OF HAFNIUM OXIDE

(A1) 20170338119: TWO-STEP FLUORINE RADICAL ETCH OF HAFNIUM OXIDE

ZHANG, HANSHEN

LIU, JIE

CUI, ZHENJIANG

APPLIED MATERIALS, INC.

39292/194

22-Nov-2017

(X0) 15438248: Extreme Ultraviolet Mask Blank Production System With Thin Absorber And Manufacturing System Therefor

(A1) 20170160632: Extreme Ultraviolet Mask Blank Production System With Thin Absorber And Manufacturing System Therefor

HASSAN, VINAYAK VISHWANATH

FOAD, MAJEED A.

BEASLEY, CARA

HOFMANN, RALF

APPLIED MATERIALS, INC.

44189/266

22-Nov-2017

(X0) 15400482: Extreme Ultraviolet Lithography Mask Blank Manufacturing System And Method Of Operation Therefor

(A1) 20170115555: Extreme Ultraviolet Lithography Mask Blank Manufacturing System And Method Of Operation Therefor

HOFMANN, RALF

BEASLEY, CARA

FOAD, MAJEED

APPLIED MATERIALS, INC.

44189/956

22-Nov-2017

(X0) 15410048: Extreme Ultraviolet Reflective Element With Multilayer Stack And Method Of Manufacturing Thereof

(A1) 20170131637: Extreme Ultraviolet Reflective Element With Multilayer Stack And Method Of Manufacturing Thereof

HOFMANN, RALF

HASSAN, VINAYAK VISHWANATH

BEASLEY, CARA

FOAD, MAJEED A.

APPLIED MATERIALS, INC.

44189/540

17-Nov-2017

(X0) 15104461: SOURCE RF POWER SPLIT INNER COIL TO IMPROVE BCD AND ETCH DEPTH PERFORMANCE

(A1) 20170200585: SOURCE RF POWER SPLIT INNER COIL TO IMPROVE BCD AND ETCH DEPTH PERFORMANCE

WANG, RONGPING

REN, RUIZHE

FARR, JON C.

MANGALORE, CHETHAN

DEMONTE, PETER

BALAKRISHNA, PARTHIBAN

APPLIED MATERIALS, INC.

44157/177

16-Nov-2017

(X0) 15591694: SENSOR BASED AUTO-CALIBRATION WAFER

(A1) 20170326733: SENSOR BASED AUTO-CALIBRATION WAFER

RAMACHANDRAN, NARAYANAN

BALAKRISHNAN, KARTHIK NARAYANAN

THANU, RAJKUMAR

HUDGENS, JEFFREY

APPLIED MATERIALS, INC.

42566/341

16-Nov-2017

(X0) 15668064: RF CHOKE FOR GAS DELIVERY TO AN RF DRIVEN ELECTRODE IN A PLASMA PROCESSING APPARATUS

(A1) 20170327946: RF CHOKE FOR GAS DELIVERY TO AN RF DRIVEN ELECTRODE IN A PLASMA PROCESSING APPARATUS

KUDELA, JOZEF

SORENSEN, CARL A.

WHITE, JOHN M.

APPLIED MATERIALS, INC.

43188/530

16-Nov-2017

(X0) 15488538: LIQUID PARTICLE COUNTING OF SEMICONDUCTOR COMPONENT PARTS

(A1) 20170330771: LIQUID PARTICLE COUNTING OF SEMICONDUCTOR COMPONENT PARTS

WANG, JIANSHENG

APPLIED MATERIALS, INC.

42212/387

16-Nov-2017

(X0) 15242078: FORMING NON-LINE-OF-SIGHT SOURCE DRAIN EXTENSION IN AN NMOS FINFET USING N-DOPED SELECTIVE EPITAXIAL GROWTH

(A1) 20170330960: FORMING NON-LINE-OF-SIGHT SOURCE DRAIN EXTENSION IN AN NMOS FINFET USING N-DOPED SELECTIVE EPITAXIAL GROWTH

BAUER, MATTHIAS

GOSSMANN, HANS-JOACHIM L.

COLOMBEAU, BENJAMIN

APPLIED MATERIALS, INC.

40390/490

16-Nov-2017

(X0) 15663068: INTEGRATED CONTROLLER SOLUTION FOR MONITORING AND CONTROLLING MANUFACTURING EQUIPMENT

(A1) 20170329293: INTEGRATED CONTROLLER SOLUTION FOR MONITORING AND CONTROLLING MANUFACTURING EQUIPMENT

CLARK, DANIEL O.

LOLDJ, YOUSSEF A.

CRAWFORD, SHAUN W.

CAYER, MAXIME

TONG, TONY H.

RIESKE, ERIC

APPLIED MATERIALS, INC.

43228/937

16-Nov-2017

(X0) 15656045: SELECTIVELY LATERAL GROWTH OF SILICON OXIDE THIN FILM

(A1) 20170323777: SELECTIVELY LATERAL GROWTH OF SILICON OXIDE THIN FILM

CHEN, YIHONG

CHAN, KELVIN

MUKHERJEE, SHAUNAK

MALLICK, ABHIJIT BASU

APPLIED MATERIALS, INC.

44128/963

16-Nov-2017

(X0) 15668647: PYROMETRY FILTER FOR THERMAL PROCESS CHAMBER

(A1) 20170330776: PYROMETRY FILTER FOR THERMAL PROCESS CHAMBER

RANISH, JOSEPH M.

ADAMS, BRUCE E.

APPLIED MATERIALS, INC.

43197/33

16-Nov-2017

(X0) 15668059: UTILIZATION OF ANGLED TRENCH FOR EFFECTIVE ASPECT RATIO TRAPPING OF DEFECTS IN STRAIN-RELAXED HETEROEPITAXY OF SEMICONDUCTOR FILMS

(A1) 20170330750: UTILIZATION OF ANGLED TRENCH FOR EFFECTIVE ASPECT RATIO TRAPPING OF DEFECTS IN STRAIN-RELAXED HETEROEPITAXY OF SEMICONDUCTOR FILMS

SRINIVASAN, SWAMINATHAN T.

KHAJA, FAREEN ADENI

SANCHEZ, ERROL ANTONIO C.

MARTIN, PATRICK M.

APPLIED MATERIALS, INC.

43188/890

16-Nov-2017

(X0) 15636239: ULTRA-CONFORMAL CARBON FILM DEPOSITION

(A1) 20170301537: ULTRA-CONFORMAL CARBON FILM DEPOSITION

BEHERA, SWAYAMBHU P.

SHAIKH, SHAHID

MANNA, PRAMIT

PANDIT, MANDAR B.

SUMMAN, TERSEM

REILLY, PATRICK

PADHI, DEENESH

KIM, BOK HOEN

PARK, HEUNG LAK

WITTY, DEREK R.

APPLIED MATERIALS, INC.

44129/92

14-Nov-2017

(X0) 15078456: DATA TUNING FOR FAST COMPUTATION AND POLYGONAL MANIPULATION SIMPLIFICATION

(A1) 20160284045: DATA TUNING FOR FAST COMPUTATION AND POLYGONAL MANIPULATION SIMPLIFICATION

(B2) 9818168: DATA TUNING FOR FAST COMPUTATION AND POLYGONAL MANIPULATION SIMPLIFICATION

LAIDIG, THOMAS L.

N/A

APPLIED MATERIALS, INC.

39320/507

14-Nov-2017

(X0) 15398011: CYCLIC OXIDE SPACER ETCH PROCESS

(A1) 20170243754: CYCLIC OXIDE SPACER ETCH PROCESS

(B2) 9818621: CYCLIC OXIDE SPACER ETCH PROCESS

TAVERNIER, AURELIEN

ZHOU, QINGJUN

CHOI, TOM

LIN, YUNGCHEN

ZHANG, YING

JOUBERT, OLIVIER

N/A

APPLIED MATERIALS, INC.

41935/79

14-Nov-2017

(X0) 13827736: OFF-ANGLED HEATING OF THE UNDERSIDE OF A SUBSTRATE USING A LAMP ASSEMBLY

(A1) 20130270107: OFF-ANGLED HEATING OF THE UNDERSIDE OF A SUBSTRATE USING A LAMP ASSEMBLY

(B2) 9818587: OFF-ANGLED HEATING OF THE UNDERSIDE OF A SUBSTRATE USING A LAMP ASSEMBLY

EWERT, MAURICE E.

SUBRAMANI, ANANTHA K.

KELKAR, UMESH M.

BALASUBRAMANYAM, CHANDRASEKHAR

RANISH, JOSEPH M.

N/A

APPLIED MATERIALS, INC.

30001/918

14-Nov-2017

(X0) 14281492: AMORPHOUS SILICON THICKNESS UNIFORMITY IMPROVED BY PROCESS DILUTED WITH HYDROGEN AND ARGON GAS MIXTURE

(A1) 20140357065: AMORPHOUS SILICON THICKNESS UNIFORMITY IMPROVED BY PROCESS DILUTED WITH HYDROGEN AND ARGON GAS MIXTURE

(B2) 9818606: AMORPHOUS SILICON THICKNESS UNIFORMITY IMPROVED BY PROCESS DILUTED WITH HYDROGEN AND ARGON GAS MIXTURE

WANG, QUNHUA

ZHAO, LAI

CHOI, SOO YOUNG

N/A

APPLIED MATERIALS, INC.

33029/974