SEARCH RESULTS for assignee:"LAM RESEARCH CORPORATION"

Showing 1 to 20 of 211 results

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(X0) 15474383: SELECTIVE DEPOSITION OF WCN BARRIER/ADHESION LAYER FOR INTERCONNECT

(A1) 20180286746: SELECTIVE DEPOSITION OF WCN BARRIER/ADHESION LAYER FOR INTERCONNECT

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(X0) 15475021: GAS ADDITIVES FOR SIDEWALL PASSIVATION DURING HIGH ASPECT RATIO CRYOGENIC ETCH

(A1) 20180286707: GAS ADDITIVES FOR SIDEWALL PASSIVATION DURING HIGH ASPECT RATIO CRYOGENIC ETCH

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(X0) 15475022: MONITORING SURFACE OXIDE ON SEED LAYERS DURING ELECTROPLATING

(A1) 20180282894: MONITORING SURFACE OXIDE ON SEED LAYERS DURING ELECTROPLATING

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(X0) 15942099: ELECTROSTATIC CHUCK WITH FLEXIBLE WAFER TEMPERATURE CONTROL

(A1) 20180286642: ELECTROSTATIC CHUCK WITH FLEXIBLE WAFER TEMPERATURE CONTROL

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(X0) 14141079: EDGE SEAL FOR LOWER ELECTRODE ASSEMBLY

(A1) 20150187614: EDGE SEAL FOR LOWER ELECTRODE ASSEMBLY

(B2) 1: EDGE SEAL FOR LOWER ELECTRODE ASSEMBLY

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(X0) 15058052: APPARATUS FOR PURGING SEMICONDUCTOR PROCESS CHAMBER SLIT VALVE OPENING

(A1) 20170256424: APPARATUS FOR PURGING SEMICONDUCTOR PROCESS CHAMBER SLIT VALVE OPENING

(B2) 1: APPARATUS FOR PURGING SEMICONDUCTOR PROCESS CHAMBER SLIT VALVE OPENING

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Patent(s)

(X0) 15595788: VAPOR DELIVERY METHOD AND APPARATUS FOR SOLID AND LIQUID PRECURSORS

(A1) 20170335450: VAPOR DELIVERY METHOD AND APPARATUS FOR SOLID AND LIQUID PRECURSORS

(B2) 1: VAPOR DELIVERY METHOD AND APPARATUS FOR SOLID AND LIQUID PRECURSORS

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(X0) 14300854: DEFECT CONTROL IN RF PLASMA SUBSTRATE PROCESSING SYSTEMS USING DC BIAS VOLTAGE DURING MOVEMENT OF SUBSTRATES

(A1) 20150357161: DEFECT CONTROL IN RF PLASMA SUBSTRATE PROCESSING SYSTEMS USING DC BIAS VOLTAGE DURING MOVEMENT OF SUBSTRATES

(B2) 1: DEFECT CONTROL IN RF PLASMA SUBSTRATE PROCESSING SYSTEMS USING DC BIAS VOLTAGE DURING MOVEMENT OF SUBSTRATES

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(X0) 14887166: ELECTROSTATIC CHUCK DESIGN FOR COOLING-GAS LIGHT-UP PREVENTION

(A1) 20170110356: ELECTROSTATIC CHUCK DESIGN FOR COOLING-GAS LIGHT-UP PREVENTION

(B2) 1: ELECTROSTATIC CHUCK DESIGN FOR COOLING-GAS LIGHT-UP PREVENTION

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(X0) 15461417: SYSTEMS AND METHODS FOR FLOW MONITORING IN A PRECURSOR VAPOR SUPPLY SYSTEM OF A SUBSTRATE PROCESSING SYSTEM

(A1) 20180265983: SYSTEMS AND METHODS FOR FLOW MONITORING IN A PRECURSOR VAPOR SUPPLY SYSTEM OF A SUBSTRATE PROCESSING SYSTEM

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(X0) 15462765: Systems and Methods for Controlling Substrate Approach Toward a Target Horizontal Plane

(A1) 20180266007: Systems and Methods for Controlling Substrate Approach Toward a Target Horizontal Plane

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(X0) 15458292: ULTRAHIGH SELECTIVE NITRIDE ETCH TO FORM FINFET DEVICES

(A1) 20180269070: ULTRAHIGH SELECTIVE NITRIDE ETCH TO FORM FINFET DEVICES

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(X0) 15913542: LAYER-BY-LAYER DEPOSITION USING HYDROGEN

(A1) 20180266001: LAYER-BY-LAYER DEPOSITION USING HYDROGEN

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(X0) 15463374: ATOMIC LAYER ETCHING OF SILICON NITRIDE

(B1) 1: ATOMIC LAYER ETCHING OF SILICON NITRIDE

(A1) 20180269071: ATOMIC LAYER ETCHING OF SILICON NITRIDE

(B2) 1: ATOMIC LAYER ETCHING OF SILICON NITRIDE

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(X0) 15690203: Ceramic Electrostatic Chuck Including Embedded Faraday Cage for RF Delivery and Associated Methods for Operation, Monitoring, and Control

(A1) 20180130690: Ceramic Electrostatic Chuck Including Embedded Faraday Cage for RF Delivery and Associated Methods for Operation, Monitoring, and Control

(B2) 1: Ceramic Electrostatic Chuck Including Embedded Faraday Cage for RF Delivery and Associated Methods for Operation, Monitoring, and Control

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(X0) 14700749: HOLLOW CATHODE DISCHARGE (HCD) SUPPRESSING CAPACITIVELY COUPLED PLASMA ELECTRODE AND GAS DISTRIBUTION FACEPLATE

(A1) 20150345020: HOLLOW CATHODE DISCHARGE (HCD) SUPPRESSING CAPACITIVELY COUPLED PLASMA ELECTRODE AND GAS DISTRIBUTION FACEPLATE

(B2) 1: HOLLOW CATHODE DISCHARGE (HCD) SUPPRESSING CAPACITIVELY COUPLED PLASMA ELECTRODE AND GAS DISTRIBUTION FACEPLATE

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(X0) 15453098: METHODS FOR WET METAL SEED DEPOSITION FOR BOTTOM UP GAPFILL OF FEATURES

(A1) 20180261502: METHODS FOR WET METAL SEED DEPOSITION FOR BOTTOM UP GAPFILL OF FEATURES

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(X0) 15452976: BOLTLESS SUBSTRATE SUPPORT ASSEMBLY

(A1) 20180261492: BOLTLESS SUBSTRATE SUPPORT ASSEMBLY

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(X0) 15454445: METHOD TO RECESS COBALT FOR GATE METAL APPLICATION

(A1) 20180261507: METHOD TO RECESS COBALT FOR GATE METAL APPLICATION

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(X0) 15453815: SELECTIVE DEPOSITION OF SILICON NITRIDE ON SILICON OXIDE USING CATALYTIC CONTROL

(A1) 20180261447: SELECTIVE DEPOSITION OF SILICON NITRIDE ON SILICON OXIDE USING CATALYTIC CONTROL