SEARCH RESULTS for assignee:"imec vzw"

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(X0) 16292139: NANOPORE FORMED THROUGH FIN BY SELF-ALIGNMENT

(A1) 20190271660: NANOPORE FORMED THROUGH FIN BY SELF-ALIGNMENT

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(X0) 16419576: Sequential Integration Process

(A1) 20190273115: Sequential Integration Process

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(X0) 16206855: SPIN-TRANSFER TORQUE DEVICE

(A1) 20190189915: SPIN-TRANSFER TORQUE DEVICE

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(X0) 16218749: Method for Producing a Pattern of Features by Lithography and Etching

(A1) 20190189458: Method for Producing a Pattern of Features by Lithography and Etching

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(X0) 16218916: ANALOG-TO-DIGITAL CONVERTERS

(A1) 20190190531: ANALOG-TO-DIGITAL CONVERTERS

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(X0) 16171627: Method for Forming a Semiconductor Structure and a Semiconductor Structure Manufactured Thereof

(A1) 20190172913: Method for Forming a Semiconductor Structure and a Semiconductor Structure Manufactured Thereof

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(X0) 16121369: Stress Sensor for Semiconductor Components

(A1) 20190074231: Stress Sensor for Semiconductor Components

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(X0) 16006835: FORCE SENSING DEVICE AND A FORCE SENSING SYSTEM

(A1) 20180364121: FORCE SENSING DEVICE AND A FORCE SENSING SYSTEM

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(X0) 16058828: Compact Fluid Analysis Device and Method to Fabricate

(A1) 20180361381: Compact Fluid Analysis Device and Method to Fabricate

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(X0) 15871190: Antimicrobial Substrate Surface

(A1) 20180213772: Antimicrobial Substrate Surface

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(X0) 15849579: Method for Selective Epitaxial Growth of a Group III-Nitride Layer

(A1) 20180211837: Method for Selective Epitaxial Growth of a Group III-Nitride Layer

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(X0) 15817343: III-N Based Substrate for Power Electronic Devices and Method for Manufacturing Same

(A1) 20180212025: III-N Based Substrate for Power Electronic Devices and Method for Manufacturing Same

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(X0) 15872308: IMAGE SENSOR, AN IMAGING DEVICE, AN IMAGING SYSTEM AND A METHOD FOR SPECTRAL IMAGING

(A1) 20180204863: IMAGE SENSOR, AN IMAGING DEVICE, AN IMAGING SYSTEM AND A METHOD FOR SPECTRAL IMAGING

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(X0) 15846584: IMAGING SENSOR

(A1) 20180182798: IMAGING SENSOR

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(X0) 15845300: Method for Forming Horizontal Nanowires and Devices Manufactured Thereof

(A1) 20180182868: Method for Forming Horizontal Nanowires and Devices Manufactured Thereof

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(X0) 15824805: V-GROOVED VERTICAL CHANNEL-TYPE 3D SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME

(A1) 20180182851: V-GROOVED VERTICAL CHANNEL-TYPE 3D SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME

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(X0) 15787605: METHOD OF FORMING NANOWIRES

(A1) 20180108526: METHOD OF FORMING NANOWIRES

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(X0) 15719411: ELECTRICALLY CONTACTING AND INTERCONNECTING PHOTOVOLTAIC CELLS

(A1) 20180090635: ELECTRICALLY CONTACTING AND INTERCONNECTING PHOTOVOLTAIC CELLS

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(X0) 15701743: Sequential Integration Process

(A1) 20180076260: Sequential Integration Process

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(X0) 15704837: Selective Fin Cut

(A1) 20180076092: Selective Fin Cut

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