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(X0) 15781410: APPARATUS FOR HOLDING A SUBSTRATE

(A1) 20180320285: APPARATUS FOR HOLDING A SUBSTRATE

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(X0) 14784042: METHOD AND APPARATUS FOR UNIFORMLY METALLIZATION ON SUBSTRATE

(A1) 20160068985: METHOD AND APPARATUS FOR UNIFORMLY METALLIZATION ON SUBSTRATE

(B2) 1: METHOD AND APPARATUS FOR UNIFORMLY METALLIZATION ON SUBSTRATE

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(X0) 15575793: METHODS AND APPARATUS FOR CLEANING SEMICONDUCTOR WAFERS

(A1) 20180151398: METHODS AND APPARATUS FOR CLEANING SEMICONDUCTOR WAFERS

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(X0) 15814246: METHOD FOR CLEANING SEMICONDUCTOR WAFERS

(A1) 20180071795: METHOD FOR CLEANING SEMICONDUCTOR WAFERS

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(X0) 15814242: SYSTEM FOR CLEANING SEMICONDUCTOR WAFERS

(A1) 20180071794: SYSTEM FOR CLEANING SEMICONDUCTOR WAFERS

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(X0) 15550971: A FALL-PROOF APPARATUS FOR CLEANING SEMICONDUCTOR DEVICES AND A CHAMBER WITH THE APPARATUS

(A1) 20180033654: A FALL-PROOF APPARATUS FOR CLEANING SEMICONDUCTOR DEVICES AND A CHAMBER WITH THE APPARATUS

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(X0) 15550960: METHOD FOR REMOVING BARRIER LAYER FOR MINIMIZING SIDEWALL RECESS

(A1) 20180025940: METHOD FOR REMOVING BARRIER LAYER FOR MINIMIZING SIDEWALL RECESS

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(X0) 14402853: METHOD AND APPARATUS FOR PULSE ELECTROCHEMICAL POLISHING

(A1) 20150155183: METHOD AND APPARATUS FOR PULSE ELECTROCHEMICAL POLISHING

(B2) 9: METHOD AND APPARATUS FOR PULSE ELECTROCHEMICAL POLISHING